Extremely thin plasma beams for new class of ``nanolithography'' required to make future computer chips
Researchers are adapting the same methods used in fusion-energy research to create extremely thin plasma beams for a new class of ``nanolithography'' required to make future computer chips.
With a bit of leverage, Cornell researchers have used a very tiny beam of light with as little as 1 milliwatt of power to move a silicon structure up to 12 nanometers.