The invention relates to a holder for a drinks container, for example a can, a beaker or a cup.
Holders of that kind for installation in motor vehicles are known per se in an enormous multiplicity of constructional forms. The known holders have a holding part, which has an insertion opening for inserting the drinks container, and a supporting part, for example of a planar shape, or even bar-shaped, arranged underneath and spaced apart from the holding part, on which supporting part the drinks container inserted into the insertion opening stands. It is known to provide the holders with a guide means so that they can be extended, pivoted out or pulled out into a use position. When the holder is not needed, it can be moved into a retracted position, for example in a door panel or a dashboard of a motor vehicle. The guide means can be in the form of, for example, a sliding guide means, which guides the holder so that it can be pulled out in the manner of a drawer, or a pivotal mounting, by means of which the holder can be pivoted out from the door panel, the dashboard or the like.
Starting from a holder of the kind described above, the invention is based on the problem of making good use of the installation space required for the holder.
The problem is solved according to the invention by the features of claim 1. The holder according to the invention has a receptacle, for example a storage compartment or an ash-tray, which is integrated with the holder. xe2x80x98Integratedxe2x80x99 within the context of the invention is understood to mean that, when the receptacle, holding part and supporting part are in the basic position, the receptacle is arranged in the same installation space as that in which the holding part and supporting part are also located. The receptacle is accordingly located between the holding part and the supporting part or, vice-versa, the holding part and supporting part are located within the receptacle. As a result, the same installation space is used for accommodating both the receptacle and also the holding part and supporting part. The installation space required for the holder according to the invention is therefore not larger than, or only slightly larger than, the installation space required for the holding part and supporting part without the receptacle. The invention consequently has the advantage that the otherwise unused installation space for the holding part and supporting part is additionally used for accommodating the receptacle. The holder according to the invention is preferably so constructed that contents placed inside the receptacle do not impede or prevent a drinks container from being inserted into the insertion opening of the holding part and placed on the supporting part. In an embodiment of the invention, the receptacle is arranged at a level between the holding part having the insertion opening for the drinks container and the supporting part for the drinks container.
The holding part and the supporting part of the holder according to the invention are preferably connected to one another; they are especially constructed integrally with one another so that they are always moved together. In principle, a common guide means for the holding part and supporting part is sufficient.


1. Field of the Invention
The present invention generally relates to interactive voice technologies and, in particular, to systems and methods for providing users with information in audible form.
2. Description of the Related Art
Information provided to users by computing devices typically is provided in a graphical form. For instance, a personal computer can be used to access a Web site that provides a user with images and/or text via a display device. In this visual context, it is known to combine graphical information provided by a variety of sources and to display the combined graphical information to the user. This enables a user to visually scan the combined graphical information and identify a topic about which the user desires to receive additional information. Once identified, the user can select the topic, such as by actuating a corresponding icon, and be provided with information related to that topic. Typically, the additional information is presented in a maximized format, i.e., at least some of the previously identified topics are no longer displayed to the user and/or the information is presented on a larger portion of the display device.
It is also desirable to provide information to users in non-graphical form, i.e., audible form. However, creating an audible analogue to the aforementioned visual context has not been adequately achieved. This is because sources of audible information typically provide grammar fragments that, when combined, cannot be interpreted by voice-rendering applications and/or, if renderable, are unnecessarily impractical. For instance, multiple grammar fragments that are received from multiple sources can be stacked (grouped together) to form a valid VoiceXML document. However, a VoiceXML document with stated grammar fragments is not properly formatted for use by a VoiceXML interpreter that typically is used to render (provide voice) corresponding to VoiceXML documents. By way of further example, if each source of audible information provides a grammar fragment that includes “If you would like to access information on ______, please say ‘_______ ’,” and an interpreter could render the stacked fragments, the user would be provided with redundant audible information, e.g., “If you would like to access information on” is repeated for each source.


The present invention relates to a novel and improved chemical-amplification negative-working photoresist composition suitable for the formation of a photoresist layer on an undercoating of an organic anti-reflection film on the surface of a substrate to give a patterned resist layer of high pattern resolution and having an excellently orthogonal cross sectional profile.
Along with the trend in recent years toward higher and higher degree of integration in various semiconductor devices, the photolithographically patterned resist layer on a substrate surface is required to have a pattern resolution of as fine as 250 nm or, as a target in the coming generation, as fine as 200 nm. Needless to say, such an extremely fine pattern resolution of the patterned resist layer cannot be accomplished without an innovative improvement in the performance of the photoresist composition which may be a chemical-amplification negative-working photoresist composition.
The above mentioned chemical-amplification negative-working photoresist composition is typically formulated with an acid-curable alkali-soluble resin such as a phenolic resin, a radiation-sensitive acid-generating agent and a crosslinking agent for the resin such as an addition product of urea or melamine and formaldehyde. While it is essential for the formation of a latent image of the pattern that the pattern-wise exposure of the photoresist layer to actinic rays is followed by a post-exposure baking (PEB) treatment, it is known that the line width of the patterned resist layer is influenced by the temperature of the PEB treatment.
When the temperature of the PEB treatment deviates out of a certain range, an appropriate line width of the patterned resist layer as desired can no longer be accomplished and the troubles thereby are more serious as the fineness of patterning is increased. Accordingly, it is eagerly desired to develop a negative-working photoresist composition of which the patterning process can be performed with a greatly increased temperature latitude for the PEB treatment or, namely, the line width of the patterned resist layer is little affected by an increase or decrease of the PEB temperature.
On the other hand, it is usual that a photoresist layer of a chemical-amplification negative-working photoresist composition is formed not directly on the surface of a substrate but on an undercoating layer of an anti-reflection film of an organic anti-reflection compound formed on the substrate surface in view of the advantage relative to the pattern resolution which can be as fine as 200 nm or even finer.
It is sometimes the case, however, that, when a conventional chemical-amplification negative-working photoresist composition is used in combination with an organic anti-reflection coating compound in the form of a solution such as the most typical commercial products of the DUV Series products (each a product by Brewer Science Co.), an excellently orthogonal cross sectional profile of the patterned resist layer can hardly be obtained and the cross sectional profile is more or less trapezoidal or skirt trailing. Accordingly, it is one of the target problems in the development works for negative-working photoresist compositions to obtain a chemical-amplification negative-working photoresist composition capable of being used in combination with an organic anti-reflection coating compound without being influenced in the pattern resolution and cross sectional profile of the patterned resist layer.
The present invention accordingly has an object, in view of the above described problems and disadvantages in the conventional negative-working photoresist composition, to provide a novel and improved negative-working photoresist composition capable of giving a photoresist layer on a substrate surface, which exhibits excellent pattern resolution in a wide range of temperature for the formation of a latent image by pattern-wise exposure of the photoresist layer to actinic rays even when used in combination with an organic anti-reflection film.
Thus, the present invention provides a negative-working photoresist composition which comprises, as a uniform solution in an organic solvent:
(A) 100 parts by weight of an alkali-soluble resin;
(B) from 0.5 to 20 parts by weight of an onium salt compound of which the anionic moiety is a fluoroalkyl sulfonate anion as a radiation-sensitive acid-generating agent; and
(C) from 3 to 50 parts by weight of an ethyleneurea compound represented by the general formula
xe2x80x83in which R1 and R2 are each a hydroxyl group or an alkoxy group having 1 to 4 carbon atoms and R3 and R4 are each a hydrogen atom, a hydroxyl group or an alkoxy group having 1 to 4 carbon atoms, as a crosslinking agent.
In addition to the above defined essential ingredients, the composition can further contain (D) from 0.01 to 1.0 part by weight of an aliphatic amine compound and/or (E) from 0.01 to 1.0 part by weight of a compound selected from the group consisting of carboxylic acids, phosphorus-containing oxoacids and esters of phosphorus-containing oxoacids.
The invention also provides a photosensitive patterning material which is an integral layered body comprising (a) a substrate, (b) a layer of an organic anti-reflection composition formed on the surface of the substrate having a thickness of 30 to 300 nm and (c) a photoresist layer formed on the anti-reflection film from the negative-working photoresist composition defined above having a thickness of 200 to 500 nm.
As is described above, the essential ingredients in the negative-working photoresist composition of the invention include the alkali-soluble resin as the component (A), an onium salt compound as the component (B) which is an acid-generating agent and a specific ethyleneurea compound as the component (C) which is a crosslinking agent for the component (A).
This unique formulation of the photoresist composition has been established as a result of the extensive investigations undertaken by the inventors with an object to develop a photosensitive patterning material of which the total thickness of a negative-working photoresist layer and an organic anti-reflection film does not exceed 800 nm leading to an unexpected discovery that this object can well be accomplished by a negative-working photoresist composition of the above mentioned formulation.
The component (A) in the inventive negative-working photoresist composition is an alkali-soluble resinous compound which is not particularly limitative and can be selected from a variety of alkali-soluble resins conventionally used in chemical-amplification photoresist compositions. Examples of alkali-soluble resinous compound particularly preferable from the standpoint of obtaining a patterned resist layer having excellent photosensitivity, pattern resolution and cross sectional profile of the patterned resist layer include copolymeric resins having a weight-average molecular weight of 2000 to 4000 and consisting of 60 to 97% by moles of hydroxystyrene units and 40 to 3% by moles of styrene units, copolymeric resins having a weight-average molecular weight of 2000 to 4000 and consisting of 60 to 97% by moles of hydroxystyrene units and 40 to 3% by moles of styrene units, of which from 5 to 30% of the hydroxyl groups in the hydroxystyrene units are substituted by alkali-insoluble groups and polyhydroxystyrene resins having a weight-average molecular weight of 2000 to 4000, of which from 3 to 40% of the hydroxyl groups in the hydroxystyrene units are substituted by alkali-insoluble groups. More preferably, the alkali-soluble resin as the component (A) is a copolymeric resin having a weight-average molecular weight of 2000 to 4000 and consisting of 60 to 97% by moles of hydroxystyrene units and 40 to 3% by moles of styrene units when excellent orthogonality of the cross sectional profile of the patterned resist layer is essential.
The alkali-insoluble group mentioned above is a group which has an effect to decrease the alkali-solubility of a basically alkali-soluble resin when the resin is substituted by such groups. Examples of the alkali-insoluble group suitable for the purpose include tertiary-alkoxycarbonyl groups such as tert-butoxycarbonyl group and tert-amyloxycarbonyl group and lower alkyl groups having 1 to 4 carbon atoms such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group and isobutyl group, of which the lower alkyl group or, in particular, isopropyl group is preferable in view of obtaining a good patterned resist layer under little influences by the ambient conditions.
The acid-generating agent as the component (B) in the inventive photoresist composition is a compound capable of releasing an acid by decomposition under irradiation with actinic rays. While a variety of radiation-sensitive acid-generating compounds are known and used in chemical-amplification photoresist compositions, the component (B) in the inventive photoresist composition is a specific onium salt compound of which the anionic moiety is a fluoroalkyl sulfonate anion. Such an onium salt compound is a known compound as disclosed in Japanese Patent Kokai 54-95686, 62-229942 and 2-120366 and elsewhere.
It is taught in Japanese Patent Publication 8-3635 that a preferable acid-generating agent in a negative-working photoresist composition for pattern-wise exposure with a KrF excimer laser beam is tris(2,3-dibromopropyl)isocyanurate because this compound has an advantage of high transparency to the KrF excimer laser beams and high pattern resolution of the patterned resist layer obtained by using this compound as the acid-generating agent.
This compound, from which a halogenoacid is generated by irradiation with actinic rays, however, is not suitable for use in a photoresist composition containing an ethyleneurea compound as a crosslinking agent because the effective photosensitivity of the photoresist composition cannot be high enough as to be applicable to an actual production line of LSIs.
Besides the above named halogenoacid-generating compound, sulfonic acid-generating compounds, such as bis(cyclohexylsulfonyl)diazomethane, are also known and used as an acid-generating agent in chemical-amplification photoresist compositions. These compounds are also not suitable for use in combination with an ethyleneurea compound because a patterned resist layer of high pattern resolution can hardly be obtained with a photoresist composition formulated with these compounds as the acid-generating agent and crosslinking agent.
It is the unexpected discovery leading to the present invention that the above described various problems can be overcome by combining a specific onium salt compound as the acid-generating agent and a specific ethyleneurea compound as the crosslinking agent in a negative-working photoresist composition to give a patterned resist layer of excellent properties.
The anionic moiety of the onium salt compound as the component (B) is a fluoroalkyl sulfonate anion. The fluoroalkyl group thereof can be a partially fluorinated or fully fluorinated alkyl group. The number of carbon atoms in the fluoroalkyl group is not particularly limitative. It is preferable, however, that the fluoroalkyl group is a perfluoroalkyl group having 1 to 10 carbon atoms because of the general trend that the acid strength of the fluoroalkyl sulfonic acid is increased as the degree of fluorination of the fluoroalkyl group is increased and the number of carbon atoms in the fluoroalkyl group is relatively small not to exceed 10.
On the other hand, the cationic moiety as the counterpart of the fluoroalkyl sulfonate anion to form the onium salt compound as the component (B) is not particularly limitative and can be selected from conventional ones. Examples of suitable cations include diphenyliodonium cations and triphenylsulfonium cations optionally substituted by one or more of lower alkyl groups such as methyl, ethyl, propyl, n-butyl and tert-butyl groups, di(lower alkyl)monophenylsulfonium cations, lower alkylcyclohexyl 2-oxocyclohexylsulfonium cations and the like.
Examples of particularly preferable cations include diphenyliodonium cations represented by the general formula
in which R5 and R6 are each a hydrogen atom, alkyl group having 1 to 4 carbon atoms or alkoxy group having 1 or 2 carbon atoms, such as diphenyliodonium and bis(4-tert-butylphenyl)iodonium cations, triphenylsulfonium cations represented by the general formula
in which R7, R8 and R9 are each a hydrogen atom, alkyl group having 1 to 4 carbon atoms or alkoxy group having 1 or 2 carbon atoms, such as triphenylsulfonium, tris(4-methylphenyl)sulfonium and tris(4-methoxyphenyl)sulfonium cations, phenyl dialkylsulfonium cations represented by the general formula
in which each R10 is an alkyl group having 1 to 4 carbon atoms, such as dimethylphenylsulfonium cations and alkyl cyclohexyl 2-oxocyclohexyl sulfonium cations represented by the general formula
in which R10 has the same meaning as defined above, such as methyl cyclohexyl 2-oxocyclohexylsulfonium cation.
The onium salt compounds particularly preferable as the component (B) in the inventive photoresist composition are those formed from these cations and trifluoromethane sulfonate or nonafluorobutane sulfonate anion or, more preferably, those formed from the triphenylsulfonium cation expressed by the above given general formula (III) and trifluoromethane sulfonate or nonafluorobutane sulfonate anion. These onium salt compounds can be used either singly or as a combination of two kinds or more.
The amount of the onium salt compound as the component (B) in the inventive photoresist composition is in the range from 0.5 to 20 parts by weight per 100 parts by weight of the alkali-soluble resin as the component (A). When the amount of the component (B) is too small, the photosensitivity of the photoresist composition cannot be high enough. When the amount of the component (B) is too large, on the other hand, the photoresist composition suffers a decrease in the focusing depth latitude or in the storage stability.
The third essential ingredient in the inventive photoresist composition is the component (C) which is an ethyleneurea compound represented by the general formula (I) to serve as a crosslinking agent of the resinous ingredient as the component (A). The compound of the general formula (I) is an ethyleneurea compound substituted at one or both of the N-atoms by a crosslink-forming group or groups selected from hydroxyalkyl groups and lower alkoxyalkyl groups or an ethyleneurea compound substituted at the 4- or 5-position thereof by a hydroxyl group or a lower alkoxy group.
While it is a conventional formulation of negative-working chemical-amplification photoresist compositions that an alkoxymethylated melamine or an alkoxymethylated urea is used as the crosslinking agent, these conventional crosslinking agents have a problem that the crosslinking activity thereof is too high so that, when extremely fine patterning is desired of the photoresist composition, the temperature range for the post-exposure baking treatment is narrowly limited and, when the photoresist layer is formed on an organic anti-reflection film, the cross sectional profile of the patterned resist layer cannot be excellently orthogonal but appearance of skirt trailing or downward narrowing is sometimes unavoidable in the cross sectional profile of the patterned resist layer.
The ethyleneurea compound of the general formula (I) used as the crosslinking agent, i.e. component (C) in the inventive photoresist composition, has only a small number of the crosslinkable groups per molecule so that the crosslinking activity of the crosslinking agent is moderately low. When such a crosslinking agent is used in combination with a specific onium salt compound as the acid-generating agent, the above described problems encountered in the use of the conventional crosslinking agent can mostly be overcome. In addition, unexpected advantages can be obtained by the use of the specific ethyleneurea compound as the crosslinking agent that the alkali-solubility of the resist layer in the areas unexposed to the actinic rays is increased so that formation of an isolated resist pattern can be performed with a decreased amount of scum formation in the development treatment.
The ethyleneurea compound represented by the general formula (I) can be easily prepared by the condensation reaction of ethyleneurea with formaldehyde to give a condensation product which can optionally be alkoxylated by the reaction with a lower alcohol.
Examples of the ethyleneurea compounds suitable as the crosslinking agent in the inventive photoresist composition include dihydroxymethyl ethyleneurea, dimethoxymethyl ethyleneurea, diethoxymethyl ethyleneurea, dipropoxymethyl ethyleneurea, dibutoxymethyl ethyleneurea, 1,3-di(methoxymethyl) 4,5-dihydroxy 2-imidazolidinone, 1,3-di(methoxymethyl) 4,5-dimethoxy 2-imidazolidinone and the like. These ethyleneurea compounds are commercially available in the form of a mixture of the monomer, dimer and trimer (MX-280, a product by Sanwa Chemical Co.).
The amount of the ethyleneurea compound as the component (C) in the inventive photoresist composition is in the range from 3 to 50 parts by weight or, preferably, from 10 to 20 parts by weight per 100 parts by weight of the component (A). When the amount of the component (C) is too small, the crosslink formation of the resinous ingredient cannot proceed completely resulting in poor properties of the patterned resist layer. When the amount of the component (C) is too large, the photoresist composition suffers a decrease in the storage stability or decrease in the photosensitivity with eventual formation of a particulate matter during storage.
In addition to the above described essential ingredients, i.e. components (A), (B) and (C), it is optional that the inventive photoresist composition is admixed with an aliphatic lower-alkyl or -alkanol amine compound as the component (D) and/or a carboxylic acid or an oxoacid of phosphorus as well as an ester thereof as the component (E). These additional ingredients are known and conventionally employed in negative-working chemical-amplification photoresist compositions in the prior art.
Examples of the above mentioned aliphatic amine compound as the component (D) include tertiary amines such as trimethylamine, triethylamine, tripropylamine, tributylamine, tripentylamine, triethanolamine and tripropanolamine and secondary amines such as dipropylamine, dibutylamine, dipentylamine and dipropanolamine.
The amount of the component (D) in the inventive photoresist composition, when added, is in the range from 0.01 to 1.0 part by weight per 100 parts by weight of the component (A).
Examples of preferable carboxylic acids as the component (E) in the inventive photoresist composition include malonic acid, citric acid, malic acid, succinic acid, benzoic acid and salicylic acid.
Examples of the oxoacid of phosphorus or a ester thereof as the other class of the component (E) include phosphoric and phosphorous acids and esters thereof such as phosphoric acid, phosphorous acid, di(n-butyl)phosphate and diphenyl phosphate, phosphonic acid and esters thereof such as phosphonic acid, dimethyl phosphonate, di(n-butyl)phosphonate, phenyl phosphonate, diphenyl phosphonate and dibenzyl phosphonate and phosphinic acid and esters thereof such as phosphinic acid and phenyl phosphinate.
The amount of the component (E) in the inventive photoresist composition, when added, is in the range from 0.01 to 1.0 part by weight per 100 parts by weight of the component (A).
It is optional that the inventive photoresist composition is admixed with the component (D) alone, component (E) alone or both of the components (D) and (E) in combination.
The photoresist composition of the present invention is prepared usually in the form of a uniform solution by dissolving the above described essential ingredients and optional ingredients in an organic solvent which is not particularly limitative provided that the solubility of each ingredient therein is high enough. Examples of suitable organic solvents include ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone and 2-heptanone, polyhydric alcohols and derivatives thereof such as ethyleneglycol, ethyleneglycol monoacetate, diethyleneglycol, diethyleneglycol monoacetate, propyleneglycol, propyleneglycol monoacetate, dipropyleneglycol and dipropyleneglycol monoacetate as well as monomethyl, monoethyl, monopropyl, monobutyl and monophenyl ethers thereof, cyclic ethers such as dioxane and esters such as methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate and ethyl ethoxypropionate. These organic solvents can be used either singly or as a mixture of two kinds or more. It is preferable that the organic solvent is a mixture of propyleneglycol monomethyl ether and propyleneglycol monomethyl ether acetate in a mixing proportion of 50:50 to 80:20 by weight in consideration of the good solubility behavior to the components (B) and (C).
Various further additives can optionally be added to the inventive photoresist composition including, for example, surface active agents having effectiveness to improve the film-forming properties of the photoresist composition in the formation of a photoresist layer.
The present invention further provides a photosensitive patterning material which is an integrally layered body comprising (a) a substrate plate, (b) an organic anti-reflection film formed on the surface of the substrate plate and (c) a photoresist layer formed on the anti-reflection film from the above described negative-working photoresist composition of the invention described above.
A variety of substrate plates can be used without particular limitations depending on the intended application. Typical examples of applicable substrate materials include semiconductor silicon wafers with or without an undercoating film of SiON, SiN, Si3N4, polycrystalline silicon and TiN and glass plates having a coating film of a metal such as tantalum and chromium.
The anti-reflection film formed on one surface of the substrate is limited to a water-insoluble organic anti-reflection film which is formed, different from an inorganic anti-reflection film usually formed by the chemical vapor-phase deposition (CVD) method of an inorganic material, by coating the substrate surface with a coating solution containing an organic ultraviolet absorbing polymeric compound in an organic solvent followed by drying and a heat treatment. Several commercial products of an organic anti-reflection coating solution are available including a product sold under the trade name of DUV-42 (a product by Brewer Science Co.).
The organic anti-reflection coating film is formed on the substrate surface in a thickness in the range from 30 to 300 nm. This thickness of the anti-reflection film as well as the thickness of the photoresist layer formed thereon are each an important factor affecting the quality of the patterned resist layer relative to the pattern resolution and orthogonality of the cross sectional profile thereof. In this regard, the photoresist layer formed from the inventive photoresist composition should have a thickness in the range from 200 to 700 nm or, preferably, from 200 to 500 nm or, more preferably, from 200 to 400 nm. When the thickness of the photoresist layer deviates out of the range, satisfactory quality of the patterned resist layer cannot be ensured relative to the dimensional accuracy and orthogonality of the cross sectional profile to negate the advantages to be obtained by the combined use of the specific components (B) and (C).
It is further optional that an additional anti-reflection coating film, which must be soluble in water, is formed on the photoresist layer in a thickness of 35 to 45 nm.


Surface patterns such as fingerprints typically are recorded for later associating a unique fingerprint with a corresponding person. Unfortunately, fingerprints and other surface patterns can be distorted depending on how much pressure is applied when making an image of the pattern. Consequently, it can be difficult for a computer or other digital device to identify a person associated with a particular print even though an image of the person's fingerprint is stored in memory for comparison.


1. Field of the Invention
The present invention relates to a semiconductor memory device and a manufacturing method of the semiconductor memory device.
2. Related Art
Data reading from a NAND flash memory is performed in a page unit. One page includes 4 k-bit to 64 k-bit data, for example. Therefore, in read operation, data of 4,000 to 64,000 memory cells are read simultaneously. Because cell current flows simultaneously to the 4,000 to 64,000 memory cells at this time, potentials of cell source lines sometimes increase (or is lifted). When the potentials of the cell source lines increase, cell current decreases. Consequently, a threshold voltage of the memory cells increases, and a distribution of the threshold voltage of the memory cells is spread. To suppress the spreading of the threshold voltage distribution, the cell source lines connecting between source drivers and sources of the memory cells preferably have as low resistance as possible. For this purpose, a top-layer wiring layer of low resistance in a multilayer wiring structure on a memory cell array can be used as cell source lines and cell well lines (see Japanese Patent Application Laid-open No. 2005-142493 and Japanese Patent Application Laid-open No. 2006-245547).
In recent years, to improve performance of memories, the ABL (All Bit Line) sense scheme has come to be used frequently. In the ABL sense scheme, sense amplifiers are provided corresponding to all bit lines and all bit lines are simultaneously read. Therefore, a large amount of current is consumed in the sense amplifiers. To supply power to the sense amplifiers, wide power source lines need to be arranged from a pad to the sense amplifiers. This increases chip size.
To further downscale the chip size, there is considered a layout of forming on the top-layer wiring layer of the memory cell array a VSS (ground potential) power source lines to be connected to the sense amplifiers, as well as the cell source lines and the cell well lines (see Kanda et al. “A 120 mm2 16 Gb 4-MLC NAND Flash Memory with 43 nm CMOS Technology” ISSCC 2008/SESSION 23/NON-VOLATILE MEMORY/23.6 p.p. 430, 431 and 625). To decrease resistance of the wiring formed on the top-layer wiring layer in this way, an installation area of each wiring is preferably increased. To increase each wiring area of the cell source lines, the cell well lines, and power source lines as far as possible, each wiring formed on the top-layer wiring layer can cover a whole upper part of the memory cell array. However, when the wiring covers the whole upper part of the memory cell array, hydrogen is not thoroughly supplied to the memory cells in a forming gas/anneal process performed at a final stage of a memory-chip manufacturing process. This becomes a cause of degradation of a data holding characteristic of the memory cells.


This invention relates generally to the separation of meat from bone in a deboning apparatus, but more particularly, pertains to a deboning apparatus that provides the designed support for all of its operating mechanisms in an axially disposed directly driven auger for inducing the separation of bone from meaty material.
A variety of prior art devices have been available for use in the separation of one component from another particularly in the food processing industry. For example, the U.S. Pat. No. 2,322,791, to DeBack, discloses the use of a cylinder screen surrounding a compression screw, and having an annular space formed between tapers at one end of the screw for use in maintaining back pressure for inducing the expressing of juice from fruits and vegetables deposited into the shown extractor. This type of extractor is pertinent for disclosing the use of an annular valve like means at the end of its screw for regulating the rate of discharge of the fruit pomace from the extractor during its functioning. The Japanese fish industry has long utilized a sorting apparatus for straining fish meat from its vertebrae structure particularly after the whole fish has been filleted thereby leaving residue meat remaining upon the boney structure of the fish. This type of embodiment is disclosed in the Japanese utility model application publication No. 5757/1965, wherein a screw is disposed within a material feed inlet for conveying the deposited fish meat towards a part of the screw that conveys the material towards a strainer roll that is concentrically arranged around the screw so that the meaty component of the fish will be pressured through the roll while the bones are conveyed towards a pressure or squeezing cylinder so as to maintain back pressure upon the material as it is conveyed along by its screw. The strainer disclosed in this publication shows generally the type of arrangement for pressure cylinders that are currently used in the deboning industry, usually with the entire apparatus itself being projecting usually from a bin that holds the bulk of the boning material prior to its being fed into the strainer assembly as herein defined. One of the main problems with this type of prior art apparatus is that the unsupported aspects of its strainer arrangement generates a high degree of vibration during functioning, which has generally limited the operational characteristics of the roll or screw itself at speeds always well below 500 revolutions per minute. Further problems with this type of prior art strainers is that the motor means providing for rotation of the screw has ordinarily not been directly coupled to the shaft of the screw itself, mainly because thought had not been given to the possibility of locating the motor in a direct drive coupling relationship to one end of the screw, generally because of lack of space thereat, and also because these type of strainers, as previously analyzed, were connected directly into the hopper or bin holding the bulk laden material, and wherein, for sanitary reasons, a motor means generally could not be located. Also, prior art deboners operated at much slower speeds which means that their screws could not be directly coupled to the motor. As a result, all of these prior art strainers generally achieve a turning of their screw by an intermediate gear box, and therefore, they are indirectly driven by the motor or drive means. An example of the more contemporary employment of this type of feature in a deboning apparatus currently being marketed is shown in the U.S. Pat. No. 3,739,994, to McFarland. In this particular patent, a compression type of screw is arranged within a meat grinder segment, while the extension of its screw is likewise formed as a compression type screw that is arranged within a perforated conduit. More significantly, it should be noted that the entire apparatus shown therein is of the cantilevered type, and mounts directly to a bin, at one end, and from which the boney material is passed into the grinder segment of the apparatus, with the compression screw achieving its drive indirectly through a gear box as shown. Once again, this particular apparatus of the prior art developes extremely high pressure throughout its extent during its functioning, and since it is unsupported, except at one end, as by being mounted only at one end, it generates enormous vibrations in the event that it is operated at any speeds in excess of 400 rpm. Furthermore, this type apparatus constantly developes enormous compressive pressures entirely along the length of its screw, thereby causing a more accelerated deterioration and frequent replacement of its perforated conduit.
It is, therefore, the principal object of this invention to provide a deboning apparatus that is fully supported by an integral base member throughout its length, particularly being bearing mounted at both of its ends so that it may be operated at excessively high revolutions so as to achieve a quicker functioning and greater capacity separation of meat from its boney component during usage of the apparatus.
Another object of this invention is to provide a deboning apparatus wherein its auger means arranged within the pressure and perforated housings is directly driven by a motor means without significant vibrations due to the presence of thrust bearings for absorbing the axial forces generated during functioning of the apparatus.
A related object of this invention is the provision of bearinged pillow blocks integrally upon the base member of a deboning apparatus for fully supporting the operating auger at its approximate ends to thereby eliminate any induced forces or vibration even while the apparatus operates at excessively high speeds.
Another significant object of this invention is to provide a deboning apparatus that can achieve two to three times the meat separation capacity output that can be attained from any other meat separating apparatus currently or heretofore available to the trade.
Another object is the provision of a deboning apparatus that is formed having its driving motor directly and axially coupled to achieve a rotation of its auger.
Yet another object of this invention is to provide a deboning apparatus that can operate at speeds in excess of 500 rpm and even up to as high as 1800 rpm.
A further object of this invention is to provide a deboning apparatus incorporating an auger which is separable into a motor coupling, pressure conveying, and valve sections, which are easily separable from each other so as to facilitate either quick assembly, or separation as for cleaning, maintenance, and parts replacement.
Still another object of this invention is the provision of a deboning apparatus in which its infeed means can be pivotally moved for providing intake of the bone laden material from a variety of directions thereby adding to the versatility and portability of the apparatus for usage.
A further principal object of this invention is to provide a deboning apparatus in which the significant pressures to achieve meat separation from its bone are built up almost exclusively within its pressure housing section, with said prepressuring being somewhat maintained and gradually dissipating during conveyance of the boney material through the perforated housing of the apparatus.
Yet another feature of this invention is the functioning of a deboning apparatus wherein the pressure release from the prepressurized bone laden material as it traverses by a perforated housing achieves the expressing of the meat from the housing without necessitating any further build up of pressure within the said housing during functioning of the deboning apparatus thereby lessening the wear upon its said perforated housing.
A related object and benefit achieved from the aforesaid type of function is the reduced abrasion exerted upon the interior of the said perforated housing thereby reducing its incidence for early replacement.
Yet a further object is the provision of a deboning apparatus wherein prepressuring is achieved through the cooperation of a grinder that couples directly to the infeed region of the pressure housing of the deboning apparatus.
Another important object of this invention is the provision of a one piece integral solid metal base member for a deboning apparatus that totally supports all of the operating components of the same.
Another object of this invention is the provision of an axially arranged discharging means directly beyond the valved section of the deboning apparatus so as to achieve a rapid removal and disposal of the boney components away from the perforated housing.
Another object is to achieve a bone abrading separation of fish or meat from its boney components within a perforated housing section that is achieved mainly through a high speed rotation of its contiguous auger.
These and other objects will become more apparent to those skilled in the art upon reviewing the summary of this invention, and upon undertaking a study of the description of the preferred embodiment in view of its drawings.


1. The Field of the Invention
This invention relates to joining plastics and, more particularly, to novel systems and methods for joining plastics of dissimilar grade.
2. The Background Art
In spin welding two parts together, also known as rotary friction welding, one part is typically held stationary, while the other part is rotated in relative rotation thereagainst. The heat generated by the friction between the two parts causes portions of both to melt. Accordingly, once relative rotation between the parts ceases, the melted material cool sand solidifies, leaving the parts chemically bonded together.
It has been discovered that the processes for friction welding or spin welding of polymeric resins of similar grade operate within certain parameters. For example, in conventional spin welding, with proper contact pressure, less than one full turn is required to generate the necessary heat and subsequent melting. These parameters however, are ineffective when resins of differing grades (i.e., cross-grade materials) are involved. The material with the lower melt point or higher melt flow index cannot maintain contact pressure or provide heat sufficient to melt the other material.
For example, it has been found that the typical 50 to 200 feet per minute of frictional travel between parts (e.g., 50 to 200 RPM on a 4 inch diameter part) is inadequate to obtain bonding in a cross-grade structural system. Likewise, it has been found that conventional interferences (required to provide friction and the cohesive material) are completely inadequate if the materials in the structure are selected from cross-grade resins.
Any friction-based welding of cross-grade components results in a preferential melting of the component having the higher melt flow index. That is, the component that melts at a lower temperature, or which flows easier, will preferentially melt, and may completely melt, before any substantial melting has occurred in the other component having a lower melt flow index.
Accordingly, a new set of operating parameters is required in order to make a friction-based or thermal weld using friction as the thermal mechanism. That is, for example, two materials that are chemically substantially the same, or closely similar in molecular structure may be melted in an injection molding machine or an extrusion machine, and form adequate components or parts. However, friction-based welding, and in particular, spin welding between a molded component (e.g. high melt index) and an extruded component (e.g. low melt flow index) has not been found to work previously.


DC offset cancel in a conventional A/D converter is conducted by inputting two analog signals serving as references, detecting a DC offset error and a gain error of A/D conversion, and canceling the errors in digital processing in a subsequent stage.
However, the above-described conventional technique has a problem that two different reference analog signals are needed. Furthermore, precisions are required of the two different reference analog signals. In addition, there is a problem of an error of the A/D converter involving single-ended to differential conversion, when conducting single-ended to differential conversion on an input signal.


The subject invention relates to interelectrode separators for eliminating zinc dendrite bridging between opposite polarity electrodes in secondary alkaline zinc batteries.
Battery separators function essentially to electrically isolate the positive and negative plates from each other. They prevent direct contact and suppress "treeing" or interelectrode dendrite growth which causes shorting of the respective plates. An ideal separator would isolate the plates without inhibiting electrolyte mobility, and without increasing the battery's internal resistance.
For many years, regenerated cellulose was the most commonly used separator for secondary zinc alkaline batteries (e.g., silver-zinc, nickel-zinc). In this regard, fibrous sausage casing and unplasticized cellophane (i.e., 0.025-0.5 mm dry thickness) were wrapped at least one time around the zinc electrode. Often several turns of the separator were used to insure adequate dendrite resistance. These cellulosic separator materials were generally utilized in conjunction with an "interseparator" which was a loosely woven or bibulous material wrapped or heat-sealed around the positive electrode to prevent the cellulosic separator from contacting the highly oxidizing environment of the positive electrode. Cellulosics performed well in vented, flooded cells but lacked long-term stability in sealed cells and at temperatures above the ambient (i.e., up to 100.degree. C.). Other problems with cellulosic separators involved swelling and degredation due to oxidation.
More recently, newer types of separators with better chemical stability and physical properties have become available. One such class of separators has been designated I/O inorganic/organic) separators and comprises a major inorganic component in a highly stable organic polymer binder. Such separators typically include various inorganic oxides, hydroxides, etc. in a fibrillated polytetrafluoroethylene (hereafter PTFE) binder. These materials are highly flexible and quite durable in the alkaline electrolyte of a secondary zinc battery. The process for making such materials essentially consists of the mixing of the PTFE and inorganic materials under mild shear conditions (e.g., liquid blender) with a high-boiling naphtha lubricant at temperatures above 19.degree. C. to cause fibrillation of the PTFE (see HS-10 bulletin by E. I. Du Pont de Nemours & Co., Plastics Dept., 1968). PTFE levels are normally in the 1-25% by weight range.
It is an object of the present invention to provide a new, low cost separator which is strong, flexible and particularly useful in preventing zinc dendrite growth between the electrodes of a secondary alkaline zinc battery. This and other objects and advantages of the present invention will become more readily apparent and understood from the following detailed description and illustration thereof.


1. Field of the Invention
The present invention relates to a technique of testing an electric circuit in its operating state. More particularly, it relates to a constitution of an apparatus or system which uses a novel probe suitable for effecting diagnosis and analysis of the operation of an integrated circuit such as an LSI including minute wirings and effects a voltage measurement to thereby be adapted for testing the integrated circuit.
In development and manufacture of semiconductor integrated circuits (LSIs), it is essential to test a semiconductor element and, where a malfunction of the element is found, check the cause (i.e., effect a fault analysis). With a recent high degree of integration of LSIs and a multiplication of input/output (I/O) pins, however, it has been difficult to effect an exact design verification and a fault analysis only by measuring signals at the I/O pins by means of an LSI tester or the like. Accordingly, it becomes necessary to effect a voltage measurement of a minute wiring in the LSI, an internal diagnosis and an analysis such as a measurement of operational waveforms. For example, there is known a method of contacting a probe having a pointed end portion directly to a measurement point, amplifying a signal detected by the probe and measuring the signal by means of an oscilloscope or the like. The method is simple and a basic approach. However, it is very difficult to measure a voltage at a much minuter internal wiring or internal electrode than the size of the probe. Also, the precision of measurement is not sufficient and there is a possibility of a secondary trouble such as a short circuit between wirings. Thus, the approach possesses a limitation in itself. In view of this, it is demanded to develop a novel measurement method or approach.
2. Description of the Related Art
As an apparatus suitable for a wiring voltage measurement of a minute pattern, there is known an apparatus using an electron beam or a light beam.
In an apparatus using an electron beam, the wiring voltage measurement is carried out by applying the electron beam to a minute wiring (measurement point) in a semiconductor integrated circuit and detecting the amount of secondary electrons emitted from the measurement point. Namely, the measurement using an electron beam utilizes the fact that the amount of secondary electrons to be detected correlates with the voltage at the measurement point.
On the other hand, as an apparatus using a light beam, for example, an apparatus utilizing an electro-optic effect is known. In the apparatus, the wiring voltage measurement is carried out by applying the light beam to a certain crystal arranged near the measurement point and detecting the amount of polarization of a light beam transmitted through or reflected from the crystal. Namely, the measurement using a light beam utilizes the fact that, when an external electric field (i.e., wiring voltage) is applied to a crystal, the refractive index of the crystal is changed. The principle of the electro-optic effect is disclosed, for example, in the publication: Valdmanis J. A., Electron. Lett. 23, 1308-1310, 1987. In this connection, the measurement of a change of a short time (e.g., below 1 [ns]) in voltage is carried out by means of a so-called sampling method which effects a voltage measurement by a pulsed beam, not a continuous beam.
Also, as another apparatus using a light beam, an apparatus utilizing a photoconductive gate is known. A photoconductive gate has characteristics in which the conductive index is very small (gate OFF state) when light is not applied thereto, and in which the conductive index is increased for a short time (gate ON state) when light is applied thereto. Therefore, it is possible to measure a voltage applied to the gate, i.e., wiring voltage by detecting a current in the photoconductive gate by means of the above characteristics.
According to the above apparatus using an electron beam, it becomes necessary to make the cross section of the electron beam small in accordance with the size of a minute measurement point. In this case, since the number of electrons contained in the beam is decreased and accordingly the number of secondary electrons is also decreased, a problem occurs in that the signal to noise (S/N) ratio is deteriorated. To cope with this, it is effective to increase the number of shots of a pulsed electron beam on a measurement point. In this case, however, another problem occurs in that time required for the measurement is prolonged. Also, the like problem is posed where a time width of an electron beam pulse is shortened for the purpose of an improvement in "time resolution" of the measurement. In this connection, considering the transit time effect of second electrons (fluctuation of the measurement timing occurring due to a slow transit speed of second electrons), an upper limit of the time resolution is approximately 5 [ps] at present and thus the realization of a higher time resolution than that value is very difficult in principle.
On the other hand, according to the apparatus using a light beam utilizing an electro-optic effect, a very high time resolution exceeding 0.5 [ps] is realized and a voltage resolution corresponding to the S/N ratio is also excellent compared with the above apparatus using an electron beam. However, since the space. resolution is determined depending on the wavelength of light, a problem occurs in that it is very difficult to measure a wiring voltage of a very minute pattern. In this connection, although it is at present possible to effect a voltage measurement with respect to a minute pattern of approximately 1 .mu.m or more, it is very difficult to effect a voltage measurement with respect to a minuter pattern than that value. Namely, the apparatus using an electron beam is excellent in respect of "space resolution" although it is insufficient in respect of "measurement time" and "time resolution", while the apparatus using a light beam is excellent in respect of "measurement time" and "time resolution" although it is insufficient in respect of "space resolution". Namely, both types have advantages and defects contrary to each other.
Also, according to the apparatus using a light beam utilizing a photoconductive gate, it is possible to obtain a voltage measurement sensitivity ten times or more compared with the apparatus using an electro-optic effect. However, a few problems are posed. For example, where a photoconductive gate is formed by applying a radiation damage to an SOS (Silicon on Sapphier), there is a disadvantage in that the photoconductive gate must be formed in advance on a LSI chip under test. Although there is a case that a photoconductive gate need not be formed in advance on a LSI chip under test, in this case, a problem occurs in that it is impossible to effect a probing to a minute wiring because the size of an electrode pad to be electrically contacted is relatively large. Also, even if the size of the contact electrode can be made small, it is very difficult to effect a precise probing to the contact electrode with respect to a minute wiring of submicron width.


Turbine engines commonly operate at efficiencies ranging from about 30% to about 40%. The operational efficiency is less than the theoretical maximum because of losses that occur in the flow path. One of the major flow path losses is due to the leakage of hot combustion gases across the tips of the turbine blades. In particular, the leakage occurs across a space between the tips of the rotating turbine blades and the surrounding stationary structure such as the ring segments. This spacing is often referred to as the blade tip clearance.
Blade tip clearances cannot be eliminated because, during transient conditions such as during engine startup or part load operation, the rotating parts (blades, rotor, and discs) and stationary parts (outer casing, blade rings, and ring segments) thermally expand at different rates. As a result, blade tip clearances can actually decrease during engine startup until steady state operation is achieved at which point the clearances can increase, thereby reducing the efficiency of the engine. Thus, there is a need for controlling blade tip clearances in order to maximize the efficiency of a turbine engine.


This invention pertains to a process wherein silicon wafers are processed in a processing chamber, which is pressurized sequentially with different atmospheres, particularly but not exclusively in oxidation of silicon wafers at high temperatures and high pressures.
It is known for silicon wafers to be oxidized by a process known as thermal oxidation and practiced at high temperatures, which typically may range from 700.degree. to 1,000.degree. C., and at high pressures, which typically may range from 5 to 25 atmospheres, in a tubular vessel, which has a removable closure. Typically, the tubular vessel is flooded preliminarily with a purging atmosphere as silicon wafers, which are disposed edgewise and uprightly on a boat, are loaded into the tubular vessel, whereupon the tubular vessel is pressurized to a processing pressure with a series of different processing atmospheres, each processing atmosphere displacing a preceding atmosphere except for a residual portion remaining with such processing atmosphere and diminishing in concentration with time.
In a typical case, the purging atmosphere is or comprises nitrogen, which may be regarded as inert under these conditions although there are some indications of its reactivity under these conditions, one of the processing atmospheres is or comprises dry oxygen, which is a slow oxidizer, and another of the processing atmospheres is or comprises steam, which is a fast oxidizer. In the same case, dry oxygen can be introduced initially at a fast rate, so as to promote displacement of the purging atmosphere of nitrogen, and subsequently at a slow rate once the purging atmosphere essentially has been displaced, so as to conserve dry oxygen. Dry oxygen effects slow formation of a thin film of silicon dioxide on the wafers. Next, steam may be introduced at a slow rate, which is limited by physical constraints of available apparatus, so as to effect fast formation of the thin film of silicon dioxide. Also, steam may be followed by dry oxygen, which may be followed by nitrogen, whereupon the tubular vessel may be depressurized.
One type of known apparatus, in which the process described above for thermal oxidation of silicon wafers can be practiced, is disclosed in U.S. Pat. No. 4,253,417, wherein the tubular vessel is enclosed within an outer vessel, which is pressurized outside the tubular vessel, so as to equalize the pressures outside and inside the tubular vessel except for a small differential so that leakage of the tubular vessel is leakage out, whereby the tubular vessel may be made of quartz, silicon, or other fragile material. Other types of known apparatus, in which similar processes can be practiced, are disclosed in U.S. Pat. No. 4,018,184 and U.S. Pat. No. 4,167,915.
In the process described above for thermal oxidation of silicon wafers, as practiced before this invention, nonuniform oxidation of the wafers has been a problem of serious magnitude. It has been found that the thin films of silicon dioxide formed on the wafers when the wafers are disposed edgewise and uprightly in the oxidizing atmosphere have observable gradients of thickness from thicker portions at upper edges of the wafers to thinner portions at lower edges of the wafers. Also, the problem is exacerbated at higher pressures (20 to 25 atmospheres) among the high pressures (5 to 25 atmospheres) discussed above, and at lower temperatures (700.degree. to 800.degree. C.) among the high temperatures (700.degree. to 1000.degree. C.) discussed above.
Because the process is thermally activated, whereupon the process proceeds more rapidly at higher temperatures and less rapidly at lower temperatures, prior efforts to deal with the problem have been directed to improved insulating, baffling, and heating measures, by which it has been found that nonuniformity of the temperature of the oxidizing atmosphere enveloping the wafers can be reduced, controlled, or eliminated, so as to alleviate the problem. The temperature of the oxidizing atmosphere at the upper and lower reaches of the tubular vessel can be measured nonintrusively by thermocouples arrayed on the tubular vessel.
However, it has been found that the problem can be alleviated but cannot be eliminated solely by such measures, as it has been found that the thin films of silicon dioxide formed on the wafers are thicker at upper edges of the wafers and thinner at lower edges of the wafers, even if the temperature of the oxidizing atmosphere enveloping the wafers is uniform at the upper and lower edges of the wafers, and even if the temperature of the oxidizing atmosphere is hotter at lower edges of the wafers and cooler at upper edges of the wafers.
Other efforts to deal with the problem have been directed to means to promote turbulent flow of the oxidizing atmosphere. However, turbulent flow of the oxidizing atmosphere may be difficult to accomplish effectively, particularly if the oxidizing atmosphere is or comprises steam at high pressures.
For a constant volume of an ideal gas, the density of the gas is proportional to the number of molecules of the gas and to the molecular weight of the gas. For constant pressure, volume, and temperature, the number of molecules of the gas is independent of the species of the gas. Thus, the density of the gas is proportional to the molecular weight of the gas at constant pressure, volume, and temperature. Thus, the density of a mixture of two, three, or more gases at constant pressure, volume, and temperature is proportional to the sum of the respective products of the molecular weights and the mole fractions of its components.
Herein, all molecular weights are stated in round numbers, whenever stated. Herein, the molecular weight of a particular atmosphere being one gas refers to its molecular weight, and the molecular weight of a particular atmosphere being a mixture of gases refers to mean molecular weight of the mixture.


The goal of plant breeding is to combine, in a single variety or hybrid, various desirable traits. For field crops, these traits may include resistance to diseases and insects, resistance to heat and drought, reducing the time to crop maturity, greater yield, and better agronomic quality. With mechanical harvesting of many crops, uniformity of plant characteristics such as germination, stand establishment, growth rate, maturity, plant height and ear height, is important. Traditional plant breeding is an important tool in developing new and improved commercial crops.


1. Technical Field
An aspect of the present invention relates to an image reading apparatus, which may be installed in a multifunction device (MFD) having a plurality of functions, such as a scanning function, a printing function, and a copying function.
2. Related Art
An MFD having a plurality of functions, such as a scanning function, a printing function and a copying function, may generally be equipped with an image reading apparatus configured to read an image from a sheet of original document. The image reading apparatus may include, for example, a so-called flatbed-typed image reading apparatus, which reads an image from the original document placed still on a so-called platen (e.g., a transparent plate of glass or resin). For another example, the image reading apparatus may be equipped with an auto-document feeder (ADF), which separates original documents placed on a document placement section automatically and conveys the separated original documents one-by-one, and reads images appearing on the separated original documents while the original documents are sequentially conveyed. Moreover, the flatbed-typed image reading apparatus may be equipped with the ADF.
The flatbed-typed image reading apparatus with the ADF may include a document feeder unit and a reader unit. The document feeder unit may be arranged on top of the reader unit, and the document feeder unit may generally be openable (and closable) with respect to the reader unit. Therefore, when a user attempts to have the image read from the original document placed still on the platen, which is arranged in an upper part of the reader unit, in other words, when the user selects not to use the document feeder unit, the user opens the document feeder unit with respect to the reader unit to place the original document on the platen manually. On the other hand, when the user selects to use the document feeder unit, the document feeder unit is not moved but is maintained closed with respect to the reader unit.
Meanwhile, the above-mentioned reader unit may be configured to form a document placement space, in which the original documents to be read are placed, and a document collecting space, in which the original documents having been read are collected. In order to reduce a space required for installation of the image reading apparatus, and in order to reduce dimensions of the image reading apparatus in depth and width, the document placement space and the document collecting space may be formed in vertically and at least partly overlapping arrangement with respect to each other. In other words, in a plane view, the document placement space and the document collecting space may at least partly overlap each other. While the document placement space and the document collecting space are continuous with each other via a document conveyer path, in order to enable the vertically overlapping arrangement, it is necessary that the document conveyer path includes a reversible path, which is curved upward or downward, and in which the original documents are inverted upside-down.
With the reversible path, when so-called regular paper, such as commercially available copier paper, is used as the original document to be read, the regular paper can be flexibly conveyed in the document conveyer path without difficulties. Meanwhile, when thicker paper, such as a postcard and business card, is used as the original document to be read, the thicker paper may be curled in the reversible path along the curvature.
Therefore, an ADF equipped with a regular conveyer path and a straight-formed different conveyer path may be suggested. The auto-document feeder may convey the regular paper in the regular conveyer path, which is formed to effectively reduce the installation space, and the thicker paper in the different straight conveyer path, so that the deformation of the thicker paper is avoided.
More specifically, the ADF may be equipped with the regular conveyer path, including straight paths and an upward curved path continuous with the straight conveyer paths. And in the regular conveyer path, the original document is conveyed from the document placement section arranged in a lower position to the document collecting section arranged in an upper position. At the same time, the ADF may be equipped with the straight-formed different conveyer path, which is branched from the regular conveyer path at an upstream position with respect to the curved path. The straight-formed different conveyer path may be formed to be narrower in width than a predetermined width so that a smaller-sized thicker paper with a width narrower than the predetermined width is guided correctly and allowed to pass there-through. In other words, the different conveyer path may allow the paper with a smaller width, which is narrower than the predetermined width, to pass there-through, while a larger-sized regular paper with a larger width, which is wider than the predetermined width, should be restricted from entering the different conveyer path.
In order to restrict the larger-sized wider paper from the different conveyer path and allow the smaller-sized narrower paper in the different conveyer path, the ADF may be provided with a rotatable member, which forms a part of the reversible path and may be rotatable to open and close entrance of the different conveyer path. The rotatable member may be rotated in conjunction with an ejection tray, which may be moved to open when used, and in which the smaller-sized narrower thicker paper should be collected.
If, however, the original document having a width wider than the predetermined width is placed on the placement section, and when the different conveyer path being narrower than the predetermined width is open to the wider original document, the wider original document may be drawn into the different conveyer path, of which width is narrower than the width of the wider original document. In this regard, the original document may be damaged or jammed in the different conveyer path.


Link aggregation schemes (e.g., EtherChannel) provide a resilient mechanism for fault tolerance, load balancing and scalable bandwidth by grouping a set of physical network interfaces into a logic link aggregation (LAG). Traffic on the logic link is evenly distributed in steady state and dynamically adjusted in response to system events to avoid traffic polarization and black-holing, which would otherwise eliminate the primary benefits of link aggregation.
While dynamic load distribution is essential to cope with link failure and operational changes, the corresponding hardware reprogramming imposes a major challenge on large scale campus and datacenter switch design. As the number of ports in the switch system increases, both the computational load and the frequency of hardware reprogramming grow exponentially, and hence adversely affect the reliability and system responsiveness of link aggregation schemes.


The present invention relates to a combine harvester. More particularly, it relates to a combine harvester having a cutting and conveyance device for crop, a threshing device for separating grain from the crop, a sieve system, and a blower system.
DE 39 06 186 A1 makes known a combine harvester of the initially stated type, which comprises a cutting and conveyance device for crop, a threshing unit for separating the grain from the crop, and a sieve system extending in the longitudinal direction of the combine harvester. A blower system is disposed upstream of the sieve system, transversely to the longitudinal direction of the combine harvester. Crop that is picked up by the cutting and conveyance device and conveyed to the combine harvester is directed to the threshing device to separate grain from the crop. The threshing device separates a large portion of the grain from the crop. The remaining crop, which comprises mainly straw and chaff, is transferred to the sieve system in order to separate out the portion of grain remaining in the crop. The blower system disposed upstream of the sieve system in the transverse direction of the combine harvester generates an air volume flow to act upon the sieve system with air, thereby assisting in the separation of heavy grains from the lighter-weight components of the crop, such as chaff and straw. The efficiency of the separation is dependent upon the consistency of the supply of the crop to the sieve system. The consistency of the supply is greatly affected when the combine harvester is in a tilted position since gravity causes crop to accumulate on the sieve system.
DE 39 06 186 A1 provides a blower system comprising a cross-flow fan which extends in the direction of travel across the entire width of the sieve system. The cross-flow fan is segmented by partition walls in order to attain a number of sectors that corresponds to the number of sieve sections of the sieve system, which are acted upon by air by the cross-flow fan. To balance the uneven crop distribution that occurs when the combine harvester is in a tilted position, the blower speed is changed in accordance with the slant.
A proven disadvantage of this blower system is that changing the blower speed has the same effect across the entire width of the sieve system. The cleaning output during the harvesting operation on the slope is clearly impaired despite a constant flow across the width of the sieve system at low throughput rates, and therefore, due to the force of gravity, the bulk phase dominates in the crop on the downhill section of the sieve system, while the flight phase dominates on the uphill section of the sieve system.


The present invention relates to air lift pumps, particularly air lift pumps for transporting wet particulate matter from a lower level to an upper level.
U.S. Pat. Nos. 5,173,194 and 4,126,546 disclose deep bed filter units having a central air lift pump for transporting dirty filter media from a bottom region of the filter to a top region of the filter. Both patents disclose a coaxial pipe arrangement wherein air is forced down a first pipe ('194 down the center pipe, '546 down the outer pipe) and is discharged into the second pipe. The rising air provides the motive force to lift dirty filter medium up the second pipe ('194 up the outer pipe, '546 up the inner pipe). These designs therefore utilize a single media transport pipe and a single point of air injection.
As the size of such units is increased, the diameter of the airlift media transport pipe must be increased. Large diameter media transport pipes require an excessive amount of air to provide the proper media flow. Additionally, such large pipes may be more expensive and more difficult to install than smaller diameter pipes.
A single point of air injection may limit the capacity of such filters. The single point must be located sufficiently close to the transport tube intake to draw the dirty media into the tube. As the flow of water, air, and dirty media travels up the transport tube, friction and turbulence reduce the rate of flow. This flow reduction effectively limits the length of the transport tube, thereby limiting the size of the unit.
Such air lift systems spray dirty media and water upwards out of the upper end of the transport tube in an uncontrolled manner. The falling media and water causes splashing when it impacts the top surface of the water contained in the wash chamber. Airborne dirty media and water particles containing impurities may be free to leave the wash chamber contaminating the filtrate. Additionally, the water transported upwards with the dirty media contributes to the volume of dirty water which must be rejected as waste water. Therefore, a significant portion of the influent water (infilt) must be disposed of as waste.
U.S. Pat. No. 5,277,829, which issued on Jan. 11, 1994 to the assignee of the present invention, discloses a deep bed filter unit in which the infilt flows upwardly through a sand bed such that the filtrate accumulates above the sand bed while the dirty sand is continuously regenerated. Dirty filtration media is collected in the lower region of the filter vessel. An air lift pump system is utilized to transport the dirty media from the lower region to wash means located in the upper region of the filter vessel where impurities are washed out of the filter media. The filter utilizes a single air lift pump having two separate air injection points to provide the motive force necessary to transport the dirty filter media. The first air injection point is located in a horizontal section of the transport pipe and establishes an initial flow of the dirty media. The second air injection point is located in a vertical section of the transport pipe and provides scouring of the dirty media and the necessary motive force to transport the dirty media to the wash means.
The use of separate air pumps in a single air pump system requires additional piping, fittings, and diffusers. The additional piping may be comprised of multiple pipe segments or intricately bent pipe to avoid interference with other filter components.
The above filters employ a single air lift pump having a single suction point for the dirty media. Such single suction air lift pumps generally do not uniformly remove dirty media from the filter lower region. It is common for dirty media to be more efficiently removed from some areas and less efficiently removed from other areas. In addition, much of the energy imparted by the second air injection point is required for lifting the dirty media to the wash means thereby limiting the amount of media scouring.


In Long-Term Evolution (LTE), time-frequency resources can be divided into 1 millisecond (ms) subframes, where each 1 ms subframe includes two 0.5 ms slots, and each slot (with normal cyclic prefix (CP) durations) includes seven single carrier frequency-division multiplexing (SC-FDMA) symbols in the time domain for uplink (UL) communication and seven orthogonal frequency-division multiplexing (OFDM) symbols in the time domain for downlink (DL) communication. In the frequency domain, resources within a slot are divided into physical resource blocks (PRBs), where each resource block spans 12 contiguous subcarriers.
In current LTE systems, resources are usually assigned using a 1 ms minimum transmission time interval (TTI) when data is available for transmission between an eNodeB (eNB) and user equipment (UE). This is referred to as dynamic scheduling. Within each scheduled TTI for UL communication, a UE transmits data over a physical uplink shared channel (PUSCH) in PRB-pairs indicated by an uplink grant to the UE from an eNB that schedules the data transmission. For DL communication, the eNB transmits data over a physical downlink shared channel (PDSCH) in PRB-pairs preceded by a DL assignment from the eNB. The DL assignment information is provided to the UE in a control channel, which is generally referred to as a physical downlink control channel (PDCCH).
Discontinuous reception (DRX) functionality is used in LTE to allow UEs to conserve power. Without DRX, a UE is always awake and continuously monitors all subframes of a PDCCH for DL assignments. With DRX, the UE powers down a portion of its circuitry during a DRX sleep mode when there are no expected data packets to be received. The eNB configures DRX with a set of DRX parameters shared with the UE. These DRX parameters can be application dependent such that power and resource savings are maximized. The eNB then schedules DL assignments during periods when the UE is actively monitoring for them.
While DRX operation results in power savings, it comes at the expense of latency. On average, a UE using DRX receives transmissions later as compared to when DRX is not used. This delay can be problematic when the transmissions are associated with a time-sensitive application executing on the UE.
Skilled artisans will appreciate that elements in the figures are illustrated for simplicity and clarity and have not necessarily been drawn to scale. For example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements to help to improve understanding of embodiments of the present disclosure.
The apparatus and method components have been represented, where appropriate, by conventional symbols in the drawings, showing only those specific details that are pertinent to understanding the embodiments of the present teachings so as not to obscure the disclosure with details that will be readily apparent to those of ordinary skill in the art having the benefit of the description herein.


This invention relates to impact tools such as hammers. More specifically, this invention relates to an improved hammer having exposed metallic impact surfaces with the remainder of said hammer covered by a unitary resilient encasement.
Hammers of many sizes and shapes are available throughout the prior art, and typically comprise a handle connected to a head having at least one impact surface. The specific construction of the hammer handle and head, and even the striking surface, varies widely according to the desired specialized use of the hammer. That is, hammers for some applications are provided with heads formed from steel or the like to provide hard metallic impact surfaces. See, for example, U.S. Pat. No. 3,341,261. Alternately, for other applications hammers are provided with heads formed from Babbitt or other soft compositions such as lead or rubber to provide soft, non-marring impact surfaces. See, for example, U.S. Pat. No. 2,894,550. Further, some hammers are provided with pellet-filled heads for reducing dangerous recoil upon impact. See, for example, U.S. Pat. Nos. 2,604,914 and 2,737,216.
Another specialized hammer construction comprises a skeletal hammer head and handle wholly received within a resilient encasement to provide soft impact surfaces. See, for example, U.S. Pat. Nos. 52,696 and 3,844,321. Such encased hammers are advantageous in that they cannot cause sparking when brought in contact with metallic surfaces, and they do not scratch or otherwise mar surfaces during use. Further, hammers having a resilient exterior coating are not susceptible to undesirable chipping during use and thereby have an improved life span over hammers having heads formed from Babbitt or the like.
Resilient encasements have not been used, however, with hammers requiring steel or other hard metal impact surface since it is necessary to keep the hard impact surface exposed. As a result, such hammers are therefore left with extensive exposed steel surface areas over the hammer head, and often over the handle too. These exposed steel surface areas can chip, create sparks, or scratch surface finishes both during use and when the hammer is put down. That is, when the hammer is used near other machinery, etc., portions of the hammer other than the impact surface can contact the machinery to cause sparks, chips, and scratches. Similarly, when the hammer is put down, the portions of the hammer other than the impact surface can contact other metal surfaces to cause sparks, etc.
It is desirable, therefore, to provide an improved hammer having exposed steel or other hard-faced impact surfaces wherein the remainder of the hammer is covered by a unitary, resilient encasement. Moreover, it is desirable to provide such an improved hammer which is quickly and easily assembled, made from economical materials, and of durable construction.


Websites that provide electronic services receive input from client machines in the form of requests to access content at various addresses. These requests may follow a particular sequence. For example, within a user session, an online banking service may receive, in order, a request to access, in order, a login page, a password page, an account summary page, a transaction history page, a funds transfer page, a confirmation page, and a logout request page.
However, the online banking service and websites like it are susceptible to attacks from malicious actors. For example, in some attacks, malicious code in a browser running on a user computer alters the requests to a web server in a way that avoids detection by the user.
Conventional approaches to detecting attacks from malicious actors involve comparing frequencies of various behaviors in user sessions with predicted frequencies of those behaviors. For example, an administrator may analyze the frequency of a particular viewing order of a web page and compare this frequency to that predicted by a statistical model. If the frequency in the user session exceeds the predicted frequency, an administrator labels the user session as suspect.


Conventional precision screw assemblies mandate accurate alignment of the nut and screw axes throughout the range of movement. The tables or other objects driven by the screw assembly must also be mounted so as to be accurately guided in their axial or linear motions. Also, deviations in the axis of the screw must be minute.


1. Field of the Invention
The present invention relates to a cigarette lighter device mounted on a vehicular floor console or the like.
2. Description of Related Art
Conventionally, for driver's convenience, a vehicular cigarette lighter has been assembled to an instrument panel, a floor console, or the like. Also, cigarette lighters have been disposed at a side position or an upper position of an ashtray in view of their properties (see Japanese Utility Model Provisional Publication No. 62-6147). As a conventional example, there is also available an ashtray in which a cigarette lighter is incorporated.
However, from a structural viewpoint, the above-described conventional cigarette lighter has a possibility that cigarette ash adhering to the lighter may drop, so that a floor etc. in a cabin may be made dirty. Also, some ashtrays incorporating a cigarette lighter have a mechanism such that cigarette ash adhering to the lighter drops into the ashtray. In this case, the layout must be such that the cigarette lighter and the ashtray are necessarily located at fixed positions, which poses a problem of restricted degree of freedom of design.


1. Field of the Invention
This invention relates to the field of material deposition, and more specifically, to the deposition of one or more semiconductor layers/films onto a substrate member.
2. Description of the Related Art
It is known in the field of semiconductor manufacturing that semiconductor material be selectively deposited onto a substrate member. In so doing, it is known that an in-line horizontal, and in-line vertical, or a circular assembly of vacuum deposition chambers may be used wherein the substrate member is sequentially moved from one chamber to another as is needed to achieve a desired sequence of semiconductor layers on the substrate member.
It is usual that the limited internal volume of a vacuum deposition chamber limits the physical size of a substrate member that can be inserted into the chamber(s), and upon which semiconductor material may be deposited.
It would be desirable to provide a means whereby a substrate holder would enable a larger area of substrate to be operated upon by a deposition chamber(s).


1. Field of the Invention
The present invention relates to a method of extracting characteristic image data, and more specifically, to a method of extracting characteristic image data, such as density data or the like of a human face, which is used when a color original image is copied onto a color copy material or a black-and-white copy material.
The present invention also relates to a color data conversion device for an image processing apparatus, and in particular, to a color data conversion device for an image processing apparatus in which color data obtained from a color original image is converted into hue values, saturation values, and lightness values.
2. Description of the Related Art
When a photograph of a person is viewed, the area which is most noticed is the person's face. In order to produce high-quality photographs, it is necessary to print the color and the density of a human face at an appropriate color and an appropriate density.
Conventionally, a face region in an original image of a color film is designated by a light pen, and the density data of the human face is extracted. The amount of exposure is determined based on the extracted density data so that the color of the face is printed appropriately. Such technology is disclosed in Japanese Patent Application Laid-Open Nos. 62-115430, 62-115431, 62-115432, 62-189456, 62-189457, 63-138340, and 63-178222.
However, in the above-described conventional art, there is a drawback in that the printing operation requires much time because an operator must use the light pen to designate the face region of each image. Further, automatization of the technology is difficult because an operator must view the image and designate the face region.
Methods of automatically extracting human face data have been proposed. For example, Japanese Patent Application Laid-Open Nos. 52-156624, 52-156625, 53-12330, 53-145620, 53-145621, and 53-145622 disclose the following method in which human face data is extracted by the extraction of flesh color data. Namely, a color original image is divided into a plurality of points to be photometrically measured. Each of the points to be photometrically measured is divided into three colors of R (red), G (green), and B (blue) which are photometrically measured. A determination is made as to whether the color of each photometrically measured point calculated from the photometric data falls within a flesh color range. A cluster (group) of photometrically measured points which have been determined to be within a flesh color range are used for face density data.
However, in this method, because a color within a flesh color range is used as face density data, regions, which are not face regions and which are flesh color regions such as the ground, tree trunks, clothes, and the like or are regions of a color which is similar to a flesh color, are extracted as density data. Further, even if the same subject is photographed under the same conditions, the hue of the photographed image differs in accordance with the type of film used. Therefore, when the type of film differs, there are cases in which the face density data cannot be extracted automatically. Moreover, when the color of the light source which illuminates the subject is different, the hue of the photographed image differs (e.g., an image photographed with fluorescent light as the light source may be greenish). Therefore, when the light source color differs, there are cases in which the face density data cannot be extracted automatically.
In order to solve the above-mentioned drawback which arises when the light source color differs, the photometric data of the flesh color ranges may be extracted after light source color correction is effected. Light sources can be divided broadly into sunlight, fluorescent light, and tungsten light. However, when sunlight is the light source, the hue differs in accordance with the season and the time of day. Even if the season and the time are the same, the hue differs in accordance with direct or indirect light. Further, with artificial light sources such as fluorescent light, hues vary greatly as there are various types of manufactured light sources. Accordingly, it is difficult to designate the type of light source and effect light source correction for each light source. Even if color correction could be effected perfectly, extraction could not be effected such that flesh color regions such as the ground, tree trunks or the like or regions of a color similar to a flesh color were not extracted, and cases in which the types of films differ could not be addressed.
Conventionally, there exist image processing apparatuses such as image displaying devices, image recording devices and the like. In an image displaying device, an image is read from a color original image such as a film, a print or the like, and the color original image is reproduced and displayed on the basis of the read data. In an image recording device, on the basis of the read data, an amount of exposure is determined and an image is recorded so that the color original image is reproduced.
For example, the density data of a main image, such as a human face or the like, on an original image of a color film is extracted. Based on the extracted density data, an amount of exposure is determined such that the face color is printed appropriately. Such technology is disclosed in Japanese Patent Application Laid-Open Nos. 62-115430, 62-115431, 62-115432, 62-189456, 62-189457, 63-138340 and 63-178222.
Generally, in image processing apparatuses such as those described above, in order to facilitate calculation for determining a composite color when color correction of the color original image is effected and in order to facilitate calculation for determining the tone of the color original image, R data, G data, B data expressing the densities of the three colors of red light, green light and blue light (i.e., the three primary colors R, G, B) are converted into H data, S data, and L data respectively expressing hue (H), saturation (S), and lightness (L) which are used in a color development system.
Known methods of conversion include conversion by use of a HSL hexagonal pyramid, and conversion based on the definitions of Hayden and Reins.
However, due to complex calculation using various arithmetic expressions, the processing times of the above-mentioned conversions are long. Accordingly, in an image processing apparatus, the processing time required for conversion alone is long. A drawback arises in that when this processing time is added to the time for fundamental processing of the image, the entire processing time of the processing apparatus greatly increases.
In order to solve this drawback, the calculating time can be reduced by using a high-speed type CPU. However, this results in increasing the cost of the processing apparatus. Further, the results of calculation for the above-mentioned conversions are stored in tables in advance, and the respective HSL data corresponding to the RGB data can be output by using these tables. In this way, because calculation at the time of conversion is not used, the calculating time is shortened, and processing at the apparatus can be expedited.
However, in order to output the respective HSL data corresponding to the combinations of the respective RGB data, it is necessary to provide respective tables for H, S, L. Further, the number of indices which designate the output data of the tables is the number of combinations of respective R, G, B data. Therefore, the storage capacity is large. Namely, in order to decrease the difference between densities of an image, the gradations of the image are increased. For example, when the gradations of the image are expressed by 8 bits (0 to 255), indices of (2.sup.8).sup.3 bits are required for the respective tables for outputting the HSL data. Accordingly, when the respective HSL output data are 8 bits, the storage capacity of each table is approximately (2.sup.24) bytes. Accordingly, an extremely large capacity of approximately 50 megabytes, i.e., (2.sup.24) 3, is needed for all of the respective HSL tables, which is impractical.


1. Field of Invention
This invention relates to the field of tools and more specifically to a wrench with a socket and boss type connecting means.
2. Description of Related Art
Wrenches must conform to specific parts and the space available. A typical professional or consumer will have multiple wrenches of varying head configurations. In addition to carrying multiple types of wrenches, professionals and consumers often have multiple wrenches having the same wrench head with a varying body or handle shape. Despite the multiple wrenches available on the market, however, a typical professional or consumer often will not have an optimal wrench available for a specific job. Having the optimal wrench available adds efficiency to a project and relieves physical and mental stress.
Wrenches usually have a forged construction, relying on molds for manufacture. The cost associated with making various molds is one factor contributing to the lack of variation of wrenches available in the market. Wrenches also undergo treatments to ensure they withstand the pressures and forces experienced when performing a given job.
One disadvantage to needing multiple wrenches is the large storage space required. A professional may require multiple toolboxes when transporting wrenches to a job site, or may need to choose a limited number of wrenches. Often professionals need to choose a limited set of wrenches without having knowledge of the job site or what specific obstacles they will encounter.
Selecting wrenches and limiting a working collection, whether for a specific job or in whole, also limits the number of operations that a user can perform with the tools available. Wrenches are specialized tools, and require a different wrench, or wrench head, to perform each task. Workers are limited to a finite number of wrenching jobs based on the wrenches available.
A further disadvantage to needing multiple wrenches is the weight of transporting even a portion of the wrenches needed. Wrenches are usually solid to withstand the forces generated when tightening or loosening components and are therefore heavy. Carrying multiple wrenches unnecessarily increases the physical demands of an already physically intensive job.
Existing modular wrench systems known in the art have limited positions for which wrench heads may be varied. Modular system handles are constructed as single segments having a single fixed position.
It is desirable to expand and exponentially increase the operations that may be performed using one or more of the wrenches known in art.
It is further desirable to develop a wrench system that may be manufactured using alternative processes, such as polymer-based 3-D printing, for low-torque or low-force applications, or sintered metal 3-D printing for higher torque applications.