Bridge the Gap between Light and Electron Microscopy Precisely Locate Regions of Interest – in Minutes Electron beam lithography (EBL) is the key method used to fabricate functional materials, devices, and systems at the sub-micron and nano scales. During the EBL workflow both light microscope (LM) and scanning electron microscope (SEM) are used for control and analysis of the fabricated nanostructures at the same sample areas. The ZEISS Shuttle & Find interface for correlative microscopy is invaluable for this process. This unique software package bridges your electron and fluorescent light microscopy systems together, allowing you to precisely relocate of regions of interest (ROI) in just minutes. You can also analyze thousands to millions of cubic micrometers of volume in all three dim...Read more
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