  With the rapid advances of functional dielectric metasurfaces and their
integration on on-chip nanophotonic devices, the necessity of metasurfaces
working in different environments, especially in biological applications,
arose. However, the metasurfaces' performance is tied to the unit cell's
efficiency and ultimately the surrounding environment it was designed for, thus
reducing its applicability if exposed to altering refractive index media. Here,
we report a method to increase a metasurface's versatility by covering the
high-index metasurface with a low index porous SiO$_2$ film, protecting the
metasurface from environmental changes while keeping the working efficiency
unchanged. We show, that a covered metasurface retains its functionality even
when exposed to fluidic environments.
