  In this paper we present EPIC, an efficient and effective predictor for IC
manufacturing hotspots in deep sub-wavelength lithography. EPIC proposes a
unified framework to combine different hotspot detection methods together, such
as machine learning and pattern matching, using mathematical
programming/optimization. EPIC algorithm has been tested on a number of
industry benchmarks under advanced manufacturing conditions. It demonstrates so
far the best capability in selectively combining the desirable features of
various hotspot detection methods (3.5-8.2% accuracy improvement) as well as
significant suppression of the detection noise (e.g., 80% false-alarm
reduction). These characteristics make EPIC very suitable for conducting high
performance physical verification and guiding efficient manufacturability
friendly physical design.
