  Soft ferromagnetic NiFe thin films are promising for applications in
spintronic devices because of their constituent electrical and magnetic
properties. Electron beam evaporation and sputtering techniques have been used
to deposit NiFe thin films. For in-situ stacking of NiFe with functional
complex oxides, the pulsed laser deposition (PLD) method is highly desirable.
However, the growth of high-quality NiFe (and non-oxide thin films in general)
by PLD remains a formidable task. Here, we report high-quality NiFe thin films
of various thicknesses on oxide/non-oxide substrates with desirable magnetic
properties by PLD at room temperature. The magnetic properties are found to be
strongly dependent on the laser fluence of the deposition process. The laser
fluence of 4 Joule/cm$^2$ produces the highest magnetization of ~547 emu/cc.
The small coercivity (few Oersted) and sharp ferromagnetic switching behaviour
indicate uniaxial anisotropy with an easy axis along the in-plane direction. In
addition, thickness-dependent magnetodynamics characterizations are studied via
ferromagnetic resonance. Our findings indicate the ferromagnetic
characteristics are sensitive to the quality of the oxide/non-oxide substrate
surface. These results offer significant insight into the PLD-based development
of thin metal magnetic films.
