  Photonics has been one of the primary beneficiaries of advanced silicon
manufacturing. By leveraging on mature complementary metal-oxide-semiconductor
(CMOS) process nodes, unprecedented device uniformities and scalability have
been achieved at low costs. However, some functionalities, such as optical
memory, Pockels modulation, and magnetooptical activity, are challenging or
impossible to acquire on group-IV materials alone. Heterogeneous integration
promises to expand the range of capabilities within silicon photonics. Existing
heterogeneous integration protocols are nonetheless not compatible with active
silicon processes offered at most photonic foundries. In this work, we propose
a novel heterogeneous integration platform that will enable wafer-scale,
multi-material integration with active silicon-based photonics, requiring
zero-change to existing foundry process. Furthermore, the platform will also
pave the way to a class of high-performance devices. We propose a grating
coupler design with peak coupling efficiency reaching 93%, an antenna with peak
diffraction efficiency in excess of 97%, and a broadband adiabatic polarization
rotator with conversion efficiency exceeding 99%.
