  To visualize the topography of thin oxide films during growth, thereby
enabling to study its growth behavior quasi real-time, we have designed and
integrated an atomic force microscope (AFM) in a pulsed laser deposition (PLD)
vacuum setup. The AFM scanner and PLD target are integrated in a single support
frame, combined with a fast sample transfer method, such that in-situ
microscopy can be utilized after subsequent deposition pulses. The in-situ
microscope can be operated from room temperature (RT) up to 700$^\circ$C and at
(process) pressures ranging from the vacuum base pressure of 10$^{-6}$ mbar up
to 1 mbar, typical PLD conditions for the growth of oxide films. The
performance of this instrument is demonstrated by resolving unit cell height
surface steps and surface topography under typical oxide PLD growth conditions.
