  We report on the development of millimeter-wave, lumped-element
reflectionless filters using an advanced thin-film fabrication process. Based
on previously demonstrated circuit topologies capable of achieving 50{\Omega}
impedance match at all frequencies, these circuits have been implemented at
higher frequencies than ever before by leveraging a thin-film process with
better than 2 {\mu}m feature size and integrated elements such as SiN
Metal-Insulator-Metal (MIM) capacitors, bridges, and TaN Thin-Film Resistors
(TFRs).
