  Technological advancements are strongly required to fulfill the demands of
new accelerator devices with the highest accelerating gradients and operation
reliability for the future colliders. To this purpose an extensive R&D
regarding molybdenum coatings on copper is in progress. In this contribution we
describe chemical composition, deposition quality and resistivity properties of
different molybdenum coatings obtained via sputtering. The deposited films are
thick metallic disorder layers with different resistivity values above and
below the molibdenum dioxide reference value. Chemical and electrical
properties of these sputtered coatings have been characterized by Rutherford
backscattering, XANES and photoemission spectroscopy. We will also present a
three cells standing wave section coated by a molybdenum layer $\sim$ 500 nm
thick designed to improve the performance of X-Band accelerating systems.
