  In this work, amorphous thin films in Mg-Si-O-N system were prepared in order
to investigate the dependence of optical and mechanical properties on Mg
composition. Reactive RF magnetron co-sputtering from magnesium and silicon
targets were used for the deposition of Mg-Si-O-N thin films. Films were
deposited on float glass, silica wafers and sapphire substrates in an Ar, N2
and O2 gas mixture. X-ray photoelectron spectroscopy, atomic force microscopy,
scanning electron microscopy, spectroscopic ellipsometry, and nanoindentation
were employed to characterize the composition, surface morphology, and
properties of the films.
