  Carbon is one of the most investigated materials and shows chaotic behavior
in terms of evolving structure. Synthesizing carbon materials largely depend on
the deposition technique, process parameters, condition of substrate surface
and ratios of the gaseous chemistry. A variety of techniques have been employed
to depositing carbon films from various gaseous mixtures to different substrate
materials. In this study, carbon thin and thick films are discussed for
different techniques known as hot filament chemical vapor deposition and
microwave plasma chemical vapor deposition where their synthesis process has
been explained in a new context. Here, we discuss attained dynamics of atoms or
tiny grains amalgamating into a particular phase of grain or crystallite and
electron-dynamics responsible for binding atoms in the formation of all sorts
of tiny grains, grains and crystallites controlling overall
morphology-structure of films thickness at few nanometers to several microns.
Carbon atoms when in solid state, on amalgamation at flat surface result into
bind under uniform electron-dynamics and when the amalgamation is at uneven
surface, they result into bind under non-uniform electron-dynamics. Substrates
under appropriate surface defects or abrasion result into an improved rate of
nucleation of tiny grains, hence, their increased rate of growth. This study
embarks on unexplored science of carbon films where in addition to localized
process parameters nature of substrate also influence dynamics of formation of
tiny clusters, grains and crystallites at their initial stage of formation. Our
results and discussions enlighten us to revisit the nucleation and growth
mechanisms of different sorts of films deposit at any scale and at any
substrate surface constituting different composition.
