  Growth of perovskite oxide thin films on Si in crystalline form has long been
a critical obstacle for the integration of multifunctional oxides into Si-based
technologies. In this study, we propose pulsed laser deposition of a
crystalline SrTiO3 thin film on a Si using graphene substrate. The SrTiO3 thin
film on graphene has a highly (00l)-oriented crystalline structure which
results from the partial epitaxy. Moreover, graphene promotes a sharp interface
by highly suppressing the chemical intermixing. The important role of graphene
as a 2D substrate and diffusion barrier allows expansion of device applications
based on functional complex oxides.
