  Graphene has recently attracted much interest as a material for flexible,
transparent electrodes or active layers in electronic and photonic devices.
However, realization of such graphene-based devices is limited due to
difficulties in obtaining patterned graphene monolayers on top of materials
that are degraded when exposed to a high-temperature or wet process. We
demonstrate a low-temperature, dry process capable of transfer-printing a
patterned graphene monolayer grown on Cu foil onto a target substrate using an
elastomeric stamp. A challenge in realizing this is to obtain a high-quality
graphene layer on a hydrophobic stamp made of poly(dimethylsiloxane), which is
overcome by introducing two crucial modifications to the conventional
wet-transfer method - the use of a support layer composed of Au and the
decrease in surface tension of the liquid bath. Using this technique, patterns
of a graphene monolayer were transfer-printed on
poly(3,4-ethylenedioxythiophene):polystyrene sulfonate and MoO3 both of which
are easily degraded when exposed to an aqueous or aggressive patterning
process. We discuss the range of application of this technique, which is
currently limited by oligomer contaminants, and possible means to expand it by
eliminating the contamination problem.
