  Electron-beam direct-write (EBDW) lithography systems must in the future
transmit terabits of information per second to be viable for commercial
semiconductor manufacturing. Lossless layout image compression algorithms with
high decoding throughputs and modest decoding resources are tools to address
the data transfer portion of the throughput problem. The earlier lossless
layout image compression algorithm Corner2 is designed for binary layout images
on raster-scanning systems. We propose variations of Corner2 collectively
called Corner2-EPC and Paeth-EPC which apply to electron-beam proximity
corrected layout images and offer interesting trade-offs between compression
ratios and decoding speeds. Most of our algorithms achieve better overall
compression performance than PNG, Block C4 and LineDiffEntropy while having low
decoding times and resources.
