  Atmospheric pressure plasma jet sources are currently in the focus of many
researchers for their promising applications in medical industry (e.g.
treatment of living tissues), surface modification or material etching or
synthesis. Here we report on the study of fundamental principles of deposition
of SiOx films from microplasma jets with admixture of hexamethyldisiloxane
[(CH3)3SiOSi(CH3)3, HMDSO] molecules and oxygen. The properties of the
deposited films, the composition of the plasma as measured by molecular beam
mass spectrometry and the effect of additional treatment of grown film by
oxygen or hydrogen atoms will be presented.
