  Many previous works on quantum photolithography are based on
maximally-entangled states (MES). In this paper, we generalize the MES quantum
photolithography to the case where two light beams share a $N$-photon
nonmaximally-entangled state. we investigate the correlations between quantum
entanglement and quantum photolithography. It is shown that for nonlocal
entanglement between the two light beams the amplitude of the deposition rate
can be changed through varying the degree of entanglement described by an
entanglement angle while the resolution remains unchanged, and found that for
local entanglement between the two light beams the effective Rayleigh
resolution of quantum photolithography can be resonantly enhanced.
