  We study the microstructure and magnetic properties of Ni80Fe20 thin films
grown by high power impulse magnetron sputtering (HiPIMS), and compare with
films grown by dc magnetron sputtering (dcMS). The films were grown under a
tilt angle of 35{\deg} to identical thickness of 37 nm using both techniques,
at different pressure (0.13-0.73 Pa) and substrate temperature (room
temperature and 100 {\deg}C). All of our films display effective in-plane
uniaxial anisotropy with square easy axis and linear hard axis magnetization
traces. X-ray diffraction reveals that there is very little change in grain
size within the pressure and temperature ranges explored. However, variations
in film density, obtained by X-ray reflectivity measurements, with pressure
have a significant effect on magnetic properties such as anisotropy field (Hk)
and coercivity (Hc). Depositions where adatom energy is high produce dense
films, while low adatom energy results in void-rich films with higher Hk and
Hc. The latter applies to our dcMS deposited films at room temperature and high
pressure. However, the HiPIMS deposition method gives higher adatom energy than
the dcMS and results in dense films with low Hk and Hc. The surface roughness
is found to increase with increased pressure, in all cases, however it showed
negligible contribution to the increase in Hk and Hc.
