  In this article kinetic Monte Carlo simulations for molecular beam epitaxy
(MBE) and pulsed laser depositon (PLD) are compared. It will be shown that an
optimal pattern conservation during MBE is achieved for a specific ratio of
diffusion to deposition rate. Further on pulsed laser deposition is presented
as an alternative way to control layer by layer growth. First results
concerning the island density in the submonolayer regime are shown.
