  The chemical potential and the work function of an aluminum film, which (1)
is in vacuum and (2) is located on a dielectric substrate is calculated within
the model of non-interacting electrons located in an asymmetric rectangular
potential well. For the first time in calculating these values for such a model
of a metal film, the electroneutrality condition is correctly taken into
account. This leads to the correct behavior of these values, namely: if the
thickness of the film increases, these characteristics tend to their bulk
values.
