  We introduce a sequential model for the deposition and aggregation of
particles in the submonolayer regime. Once a particle has been randomly
deposited on the substrate, it sticks to the closest atom or island within a
distance \ell, otherwise it sticks to the deposition site. We study this model
both numerically and analytically in one dimension. A clear comprehension of
its statistical properties is provided, thanks to capture equations and to the
analysis of the island-island distance distribution.
