  We demonstrate the stencil growth of nanoscale patterns using molecular
dynamic simulation. A comparison has been made to a film grown by identical
conditions without a stencil. It is shown that in the case of nanoscale
proximity between mask and substrate, patterns of the same dimension as the
mask can be obtained. The results also indicate that the obtained nanorod
presents a higher surface area than the corresponding thin film. It is
demonstrated that nanorod surface roughness decreases by merging adjacent
surface irregularity during the deposition.
