  The present study describes a facile route of zinc oxide (ZnO) grows using
the solution-dependent electrostatic spray deposition (ESD) method at
temperatures ranging from 300 {\deg}C - 500 {\deg}C. In this work, zinc
chloride (ZnCl2) was dissolved in ethanol (CH3CH2OH) to prepare the 0.1 M
concentration of 20 ml for spray solution by ESD. Adding different deionized
water (H2O) ratio, three different solutions were prepared. The results reveal
that adding H2O ration, suppressing the c-axis crystal growth of ZnO thin
films. The adhesion of anions was believed to be responsible for this
suppression. XRD texture analysis examined the preferred orientations of the
(100) and (002) planes of the ZnO thin films. Microstructural parameters
namely, lattice parameters, bond length, positional parameters, full width at
half maximum, crystallite sizes, lattice strain, and lattice dislocation
density, are investigated. This research marks a turning point in
cost-effective industrial and commercial applications for ESD-deposited
electronics.
