  We perform a comprehensive study of noise-induced effects in a stochastic
model of reaction-diffusion type, describing nano-structured thin films growth
at condensation. We introduce an external flux of adsorbate between neighbour
monoatomic layers caused by the electrical field presence near substrate in
plasma-condensate devices. We take into account that the strength of the
electric field fluctuates around its mean value. We discuss a competing
influence of the regular and stochastic parts of the external flux onto the
dynamics of adsorptive system. It will be shown that the introduced
fluctuations induce first-order phase transition in a homogeneous system,
govern the pattern formation in a spatially extended system; these parts of the
flux control the dynamics of the patterning, spatial order, morphology of the
surface, growth law of the mean size of adsorbate islands, type and linear size
of surface structures. The influence of the intensity of fluctuations onto
scaling and statistical properties of the nano-structured surface is analysed
in detail. This study provides an insight into the details of noise induced
effects at pattern formation processes in anisotropic adsorptive systems.
