  Reproducible high-Tc Josephson junctions have been made in a rather simple
two-step process using ion irradiation. A microbridge (1 to 5 ?m wide) is
firstly designed by ion irradiating a c-axis-oriented YBa2Cu3O7-? film through
a gold mask such as the non-protected part becomes insulating. A lower Tc part
is then defined within the bridge by irradiating with a much lower fluence
through a narrow slit (20 nm) opened in a standard electronic photoresist.
These planar junctions, whose settings can be finely tuned, exhibit
reproducible and nearly ideal Josephson characteristics. This process can be
used to produce complex Josephson circuits.
