  In this work, the single-component Cu metallic glass was fabricated by the
physical vapor deposition on the Zr (0001) crystal substrate at 100 K using the
classical molecular dynamic simulation. The same deposition process was
performed on the Cu (1 0 0) and Ni (1 0 0) crystal substrate for comparison,
only the Cu crystal deposited layer with the fcc structure can be obtained.
When depositing the Cu atoms on the Zr substrate at 300 K, the crystal
structure was formed, which indicates that except the suitable substrate, low
temperature is also a key factor for the amorphous structure formation. The Cu
liquid quenching from 2000 K to 100 K were also simulated with the cooling rate
1012 K/s to form the Cu glass film in this work. The Cu metallic glass from the
two different processes (physical vapor deposition and rapid thermal quenching
from liquid) revealed the same radial distribution function and X-ray
diffraction pattern, but the different microstructure from the coordination
number and Voronoi tessellation analysis.
