  Image stitching with parallax is still a challenging task. Existing methods
often struggle to maintain both the local and global structures of the image
while reducing alignment artifacts and warping distortions. In this paper, we
propose a novel approach that utilizes epipolar geometry to establish a warping
technique based on the epipolar displacement field. Initially, the warping rule
for pixels in the epipolar geometry is established through the infinite
homography. Subsequently, the epipolar displacement field, which represents the
sliding distance of the warped pixel along the epipolar line, is formulated by
thin-plate splines based on the principle of local elastic deformation. The
stitching result can be generated by inversely warping the pixels according to
the epipolar displacement field. This method incorporates the epipolar
constraints in the warping rule, which ensures high-quality alignment and
maintains the projectivity of the panorama. Qualitative and quantitative
comparative experiments demonstrate the competitiveness of the proposed method
for stitching images with large parallax.
