  Advanced synthesis of semiconductor nanowires (NWs) enables their application
in diverse fields, notably in chemical and electrical sensing, photovoltaics,
or quantum electronic devices. In particular, Indium Arsenide (InAs) NWs are an
ideal platform for quantum devices, e.g. they may host topological Majorana
states. While the synthesis has been continously perfected, only few techniques
were developed to tailor individual NWs after growth. Here we present three wet
chemical etch methods for the post-growth morphological engineering of InAs NWs
on the sub-100 nm scale. The first two methods allow the formation of
self-aligned electrical contacts to etched NWs, while the third method results
in conical shaped NW profiles ideal for creating smooth electrical potential
gradients and shallow barriers. Low temperature experiments show that NWs with
etched segments have stable transport characteristics and can serve as building
blocks of quantum electronic devices. As an example we report the formation of
a single electrically stable quantum dot between two etched NW segments.
