  Fourier microscopy is becoming an increasingly important tool for the
analysis of optical nanostructures and quantum emitters. However, achieving
quantitative Fourier space measurements requires a thorough understanding of
the impact of aberrations introduced by optical microscopes, which have been
optimized for conventional real-space imaging. Here, we present a detailed
framework for analyzing the performance of microscope objectives for several
common Fourier imaging configurations. To this end, we model objectives from
Nikon, Olympus, and Zeiss using parameters that were inferred from patent
literature and confirmed, where possible, by physical disassembly. We then
examine the aberrations most relevant to Fourier microscopy, including the
alignment tolerances of apodization factors for different objective classes,
the effect of magnification on the modulation transfer function, and
vignetting-induced reductions of the effective numerical aperture for
wide-field measurements. Based on this analysis, we identify an optimal
objective class and imaging configuration for Fourier microscopy. In addition,
as a resource for future studies, the Zemax files for the objectives and setups
used in this analysis have been made publicly available.
