  In semiconductor manufacturing, contamination due to particulates
significantly decreases the yield and quality of device fabrication, therefore
increasing the cost of production. Dust particle clouds can be found in almost
all plasma processing environments including both plasma etching devices and in
plasma deposition processes. Dust particles suspended within such plasmas will
acquire an electric charge from collisions with free electrons in the plasma.
If the ratio of inter-particle potential energy to the average kinetic energy
is sufficient, the particles will form either a liquid structure with short
range ordering or a crystalline structure with long range ordering. Otherwise,
the dust particle system will remain in a gaseous state. Many experiments have
been conducted over the past decade on such colloidal plasmas to discover the
character of the systems formed, but more work is needed to fully understand
these structures. The preponderance of previous experiments used monodisperse
spheres to form complex plasma systems.
