  Limited by the cost and complexity, superresolution lithography is hard to
achieve through the traditional interference lithography. We here developed the
plasmonic interference lithography technique by using a hyperbolic
metamaterials (HMMs) / photoresist / metal plasmonic waveguide to push the
feature sizes theoretically down to 16 nm and even to 11 nm at the wavelength
of 365 nm with TM polarization. The waveguide based on the proposed HMMs can
support high-k mode for superresolution lithography. Furthermore, plasmonic
mode supported in the proposed lithography structure can be tailored by
dimension of HMM and permittivity of the materials, which makes it possible to
get higher resolution pattern under conventional UV light. Our findings open up
an avenue to pushing the nanolithography node towards 10 nm for low-cost and
large area fabrication under conventional UV light source.
