  Radio frequency particle accelerators are ubiquitous in ultra-small and
ultrafast science, but their size and cost has prompted exploration of compact
and scalable alternatives like the dielectric laser accelerator. We present the
first demonstration of high gradient laser acceleration and deflection of
electrons with a silicon structure. Driven by a five nanojoule, 130 fs
mode-locked Ti:Sapphire laser at 907 nm wavelength, our devices achieve
accelerating gradients in excess of 200 MeV/m and sub-optical cycle streaking
of 96.30 keV electrons. These results pave the way for high gradient silicon
dielectric laser accelerators using commercial lasers and sub-femtosecond
electron beam experiments.
