  We propose and demonstrate a convenient and sensitive technique for precise
engineering of group-velocity dispersion in high-Q silicon microresonators. By
accurately controlling the surface-oxidation thickness of silicon microdisk
resonators, we are able to precisely manage the zero-dispersion wavelength
while simultaneously further improving the high optical quality of our devices,
with the optical Q close to a million. The demonstrated dispersion management
allows us to achieve parametric generation with precisely engineerable emission
wavelengths, which shows great potential for application in integrated silicon
nonlinear and quantum photonics.
