  Triple patterning lithography (TPL) has received more and more attentions
from industry as one of the leading candidate for 14nm/11nm nodes. In this
paper, we propose a high performance layout decomposer for TPL. Density
balancing is seamlessly integrated into all key steps in our TPL layout
decomposition, including density-balanced semi-definite programming (SDP),
density-based mapping, and density-balanced graph simplification. Our new TPL
decomposer can obtain high performance even compared to previous
state-of-the-art layout decomposers which are not balanced-density aware, e.g.,
by Yu et al. (ICCAD'11), Fang et al. (DAC'12), and Kuang et al. (DAC'13).
Furthermore, the balanced-density version of our decomposer can provide more
balanced density which leads to less edge placement error (EPE), while the
conflict and stitch numbers are still very comparable to our
non-balanced-density baseline.
