  Quantum lithography achieves phase super-resolution using fragile,
experimentally challenging entangled states of light. We propose a scalable
scheme for creating features narrower than classically achievable, with reduced
use of quantum resources and consequently enhanced resistance to loss. The
scheme is an implementation of interferometric lithography using a mixture of
an SPDC entangled state with intense classical coherent light. We measure
coincidences of up to four photons mimicking multiphoton absorption. The
results show a narrowing of the interference fringes of up to 30% with respect
to the best analogous classical scheme using only 10% of the non-classical
light required for creating NOON states.
