  Exciton-polaritons represent a promising platform that combines the strengths
of both photonic and electronic systems for future optoelectronic devices.
However, their application is currently limited to laboratory research due to
the high cost and complexity of fabrication methods, which are not compatible
with the mature CMOS technology developed for microelectronics. In this work,
we develop an innovative, low-cost, and CMOS-compatible method for fabricating
large surface polaritonic devices. This is achieved by direct patterning of a
halide-perovskite thin film via thermal nanoimprint. As a result, we observe
highly homogeneous polaritonic modes of quality factor $Q\approx 300$ at room
temperature across a centimetric scale. Impressively, the process provides high
reproducibility and fidelity, as the same mold can be reused more than 10 times
to imprint the perovskite layer on different types of substrates. Our results
could pave the way for the production of low-cost integrated polaritonic
devices operating at room temperature.
