  The growth of amorphous TiO2 and anisotropic-polycrystalline ZnO thin-films
is studied by means of coarse-grained three-dimensional kinetic Montecarlo
simulations under conditions typically encountered in Plasma Enhanced Chemical
Vapor Deposition experiments. The approach developed considers fluctuations in
the activation energy for surface diffusion of the coarse particles that are
calculated on-the-fly and depends on the mesoscale local
morphological/structural landscape. The basis of this approach --which is known
to work well to simulate the growth of amorphous materials using a much simpler
cubic grid-- has been extended in this work to reproduce not only the
morphological characteristics and scaling properties of amorphous TiO2 but also
the growth of polycrystalline ZnO with a good approximation, including the
evolution of the film texture and textured-grain competition during growth and
its dependence on experimental conditions. The results of the simulations have
been compared with available experimental data obtained by X-Ray Diffraction,
analysis of the texture coefficients, Atomic Force Microscopy and Scanning
Electron Microscopy
