  We investigate the electronic properties of heterostructures based on
ultrathin hexagonal boron nitride (h-BN) crystalline layers sandwiched between
two layers of graphene as well as other conducting materials (graphite, gold).
The tunnel conductance depends exponentially on the number of h-BN atomic
layers, down to a monolayer thickness. Exponential behaviour of I-V
characteristics for graphene/BN/graphene and graphite/BN/graphite devices is
determined mainly by the changes in the density of states with bias voltage in
the electrodes. Conductive atomic force microscopy scans across h-BN terraces
of different thickness reveal a high level of uniformity in the tunnel current.
Our results demonstrate that atomically thin h-BN acts as a defect-free
dielectric with a high breakdown field; it offers great potential for
applications in tunnel devices and in field-effect transistors with a high
carrier density in the conducting channel.
