  Patterning graphene into various mesoscopic devices such as nanoribbons,
quantum dots, etc. by lithographic techniques has enabled the guiding and
manipulation of graphene's Dirac-type charge carriers. Graphene, with
well-defined strain patterns, holds promise of similarly rich physics while
avoiding the problems created by the hard to control edge configuration of
lithographically prepared devices. To engineer the properties of graphene via
mechanical deformation, versatile new techniques are needed to pattern strain
profiles in a controlled manner. Here we present a process by which strain can
be created in substrate supported graphene layers. Our atomic force
microscope-based technique opens up new possibilities in tailoring the
properties of graphene using mechanical strain.
