  Dielectric laser accelerators (DLAs) have proven to be good candidates for
miniaturized particle accelerators. They rely on micro-fabricated dielectrics
which are able to modulate the kinetic energy of the incoming electron beam
under a proper laser illumination. In this paper we demonstrate a dual pillar
structure with a distributed Bragg reflector to mimic a double sided
illumination to the electron path. The structure is fabricated by an electron
beam lithography technique followed by a cryogenic reactive ion etching
process. Such a structure can accelerate the injected 28 keV electrons by a
gradient of approximately 150 MeV/m which can be further optimized towards the
GeV/m regime.
