  Shape anisotropy provides a simple mechanism to adjust the local bias field
in patterned structures. It is well known that for ellipsoidal particles $<1$
$\mu$m in size, a quasi-single domain state can be realized with uniform
anisotropy field. For larger patterned ferromagnetic thin-film elements, domain
formation is thought to limit the effectiveness of shape anisotropy. In our
work we show that very soft lithographically patterned Ni$_{80}$Fe$_{20}$ films
with control of induced magnetic anisotropy can exhibit shape anisotropy fields
in agreement with single-domain models, for both hysteresis loop measurements
at low field and ferromagnetic resonance measurements at high field. We show
the superiority of the fluxmetric form over the magnetometric form of
anisotropy estimate for thin films with control dimensions from 10 $\mu$m to
150 $\mu$m and in-plane aspect ratios above 10.
