  Magnetron sputtering has also been used to deposit thin films of some
materials and it has significant technological importance. A modeling on
deposition of epitaxial thin films of Yttrium Stabilized Zirconia (YSZ) was
done the diffusion of adatom on the surface were studies. There exists a strong
interaction of ions formed in the plasma during the sputtering process. Cu thin
films were deposited on Si. Nanocomposite thin film of SiCN showed dendritic
growth.
