  The basic principles of design for the compact ion source of new generation
are presented. The device uses the local ion trap created by the axial electron
beam rippled in a thick magnetic lens. In accordance with this feature, the ion
source is given the name main magnetic focus ion source. The experimental
evidences for the production of Ir$^{59+}$, Xe$^{44+}$, and Ar$^{16+}$ ions are
obtained. The control over depth of the local ion trap is shown to be feasible.
