  An extended study on an advanced method for the cleaning of carbon
contaminations on large optical surfaces using a remote inductively coupled low
pressure RF plasma source (GV10x downstream asher) is reported in this work.
Technical as well as scientific features of this scaled up cleaning process are
analyzed, such as the cleaning efficiency for different carbon allotropes
(amorphous and diamond-like carbon) as a function of feedstock gas composition,
RF power (ranging from 30 to 300W), and source-object distances (415 to 840
mm). The underlying physical phenomena for these functional dependences are
discussed.
