  A system of automated computerized Langmuir probe measurements is used in
order to determine the plasma parameters in a plasma reactor constructed for
cleaning of metallic artifacts by RF discharge. A compensated probe insures the
suppression of the RF interference. The probe data are collected using a
commercial data acquisition unit connected to a portable computer. The raw data
are processed using wavelet transforms techniques which assures the de-noising
of the probe signal without distortion of the probe I-V characteristic. The
first and second derivatives of the I-V characteristic are determined. The
measurement of the electron density spatial distribution in the inter-electrode
distance indicates a flat density profile in the middle region of the
discharge.
