  We investigate the histograms of conductance values obtained during
controlled electromigration thinning of Cu thin films. We focus on the question
whether the most frequently observed conductance values, apparent as peaks in
conductance histograms, can be attributed to the atomic structure of the wire.
To this end we calculate the Fourier transform of the conductance histograms.
We find all the frequencies matching the highly symmetric crystallographic
directions of fcc-Cu. In addition, there are other frequencies explainable by
oxidation and possibly formation of hcp-Cu. With these structures we can
explain all peaks occurring in the Fourier transform within the relevant range.
The results remain the same if only a third of the samples are included. By
comparing our results to the ones available in the literature on work-hardened
nanowires we find indications that even at low temperatures of the environment,
metallic nanocontacts could show enhanced electromigration at low current
densities due to defects enhancing electron scattering.
