  Structural and kinetic aspects of 2-D irreversible metal deposition under
potentiostatic conditions are analyzed by means of dynamic Monte Carlo
simulations employing embedded atom potentials for a model system. Three
limiting models, all considering adatom diffusion, were employed to describe
adatom deposition.The first model (A) considers adatom deposition on any free
substrate site on the surface at the same rate. The second model (B) considers
adatom deposition only on substrate sites which exhibit no neighboring sites
occupied by adatoms. The third model (C) allows deposition at higher rates on
sites presenting neighboring sites occupied by adatoms.
