  Tomographic Volumetric Additive Manufacturing (TVAM) allows printing of
mesoscopic objects within seconds or minutes. Tomographic patterns are
illuminated onto a rotating glass vial which contains a photosensitive resin.
Current pattern optimization is based on a ray optical assumption which
ultimately leads to limited resolution around $20\mu\textrm{m}$ and varying
throughout the volume of the 3D object. In this work, we introduce a rigorous
wave-based optical amplitude optimization scheme for TVAM which shows that
high-resolution printing is theoretically possible over the full volume. The
wave optical optimization approach is based on an efficient angular spectrum
method of plane waves with custom written memory efficient gradients and allows
for optimization of realistic volumes for TVAM such as $(100\mu\textrm{m})^3$
or $(10\textrm{mm})^3$ with $550^3$ voxels and 600 angles. Our simulations show
that ray-optics start to produce artifacts when the desired features are
$20\mu\textrm{m}$ and below and more importantly, the amplitude modulated TVAM
can reach micrometer features when optimizing the patterns using a full wave
model.
