  The use of Standard Reference Materials (SRM) from the National Institute of
Standards and Technology (NIST) for quantitative analysis of chemical
composition using Synchrotron based X-Ray Florescence (SR-XRF) and Scanning
Transmission X-Ray Microscopy (STXM) is common. These standards however can
suffer from inhomogeneity in chemical composition and thickness and often
require further calculations, based on sample mounting and detector geometry,
to obtain quantitative results. These inhomogeneities negatively impact the
reproducibility of the measurements and the quantitative measure itself. Atomic
Layer Deposition (ALD) is an inexpensive, scalable deposition technique known
for producing uniform, conformal films of a wide range of compounds on nearly
any substrate material. These traits make it an ideal deposition method for
producing films to replace the NIST standards and create SRM on a wide range of
relevant 2D and 3D substrates. Utilizing Rutherford Backscattering, X-ray
Reflectivity, Quartz crystal microbalance, STXM, and SR-XRF we show that ALD is
capable of producing films that are homogenous over scales ranging from 100's
of microns to nms
