  Micron-thick boron films have been deposited by Pulsed Laser Deposition in
vacuum on several substrates at room temperature. The use of high energy pulses
(>700 mJ) results in the deposition of smooth coatings with low oxygen uptake
even at base pressures of 10$^{-4}$ - 10$^{-3}$ Pa. A detailed structural
analysis, by X-Ray Diffraction and Raman, allowed to assess the amorphous
nature of the deposited films as well as to determine the base pressure that
prevents boron oxide formation. In addition the crystallization dynamics has
been characterized showing that film crystallinity already improves at
relatively low temperatures (800 {\deg}C). Elastic properties of the boron
films have been determined by Brillouin spectroscopy. Finally, micro-hardness
tests have been used to explore cohesion and hardness of B films deposited on
aluminum, silicon and alumina. The reported deposition strategy allows the
growth of reliable boron coatings paving the way for their use in many
technology fields.
