  We investigated the transport titanium ions produced in a reactive high-power
impulse magnetron sputtering (HiPIMS) device used for TiN coating deposition.
Time-resolved mass spectrometry measurements of ionized sputtered atoms
correlated to time-resolved tuneable diode-laser induced fluorescence
(TR-TDLIF) measurements of neutral sputtered atoms were used to understand
transport features. Based on ion energy distributions of Ti$^+$, we identified
four populations of ions and explore their physical origins. The signals of all
ion populations decrease strongly when only 1% N$_2$ is added to the Ar/N$_2$
gas mixture. Time resolved mass spectrometry confirms the result reported in
previous work: the fast target poisoning when nitrogen is added in HiPIMS
discharges. Based on the measured energy distribution functions of Ti$^{++}$,
N$^+$, N$_2^+$, and Ar$^+$, we discuss the production of these ions in HiPIMS
discharges. The temperature of thermalized sputtered neutral atoms determined
by previous TR-TDLIF measurements evidences the physical origin of an ion
population with energies lower than 4 eV. According to discharge pressure,
cathode voltage, and ion type, we also discuss the physical origins of
high-energy ions (>4 eV).
