  Metal halide perovskite solar cells being one of the fastest emerging
technologies for renewable energy still has to become more industry friendly in
a way that will allow using it for thin film modules or tandems with
conventional silicon devices. The simplest way to achieve this is to use
chemical vapor deposition (CVD) technique for tandem production. In this work,
we show a method for a single step production of MAPbI3 films in a simple
two-zone CVD reactor from lead diacetate and methyl-ammonium iodide powders.
Obtained films show highly ordered cubic MAPbI3 phase with a thickness of
400-500 um, good photoluminescence response and absorption band edge similar to
spin-coated film. We used those films to produce p-i-n solar cells with
ITO/NiO/MAPbI3/C60/Cu structure. The best cell showed negligible 0.23 % PCE
right after the manufacturing but significantly improved to 5.5 % PCE after 8
hours of storage in the dark. The main limiting factor affecting the efficiency
is low current density, which we attribute to non-optimized growth conditions;
however, our approach is a first step to a single step CVD deposition of MAPbI3
on any type of substrates including texturized silicon subcells for better
overall efficiency.
