  With their fast response time and a spatial resolution in the range of a few
microns, microchannel plates (MCPs) are a prominent choice for the development
of detectors with highest resolution standards. Amorphous silicon-based
microchannel plates (AMCPs) aim at overcoming the fabrication drawbacks of
conventional MCPs and the long dead time of their individual channels. AMCPs
are fabricated via plasma deposition and dry reactive ion etching. Using a
state-of-the-art dry reactive ion etching process, the aspect ratio, so far
limited to a value of 14, could be considerably enhanced with a potential for
very high gain values. We show first fabricated AMCP devices and provide an
outlook for gain values to be expected based on the fabrication results.
