  The development of superconducting qubit technology has shown great potential
for the construction of practical quantum computers. As the complexity of
quantum processors continues to grow, the need for stringent fabrication
tolerances becomes increasingly critical. Utilizing advanced industrial
fabrication processes could facilitate the necessary level of fabrication
control to support the continued scaling of quantum processors. However, these
industrial processes are currently not optimized to produce high coherence
devices, nor are they a priori compatible with the commonly used approaches to
make superconducting qubits. In this work, we demonstrate for the first time
superconducting transmon qubits manufactured in a 300 mm CMOS pilot line, using
industrial fabrication methods, with resulting relaxation and coherence times
already exceeding 100 microseconds. We show across-wafer, large-scale
statistics studies of coherence, yield, variability, and aging that confirm the
validity of our approach. The presented industry-scale fabrication process,
using exclusively optical lithography and reactive ion etching, shows
performance and yield similar to the conventional laboratory-style techniques
utilizing metal lift-off, angled evaporation, and electron-beam writing.
Moreover, it offers potential for further upscaling by including
three-dimensional integration and additional process optimization using
advanced metrology and judicious choice of processing parameters and splits.
This result marks the advent of more reliable, large-scale, truly
CMOS-compatible fabrication of superconducting quantum computing processors.
