  Nano-size objects like metal clusters present an ideal system for the study
of quantum phenomena and for constructing practical quantum devices.
Integrating these small objects in a macroscopic circuit is, however, a
difficult task. So far the nanoparticles have been contacted and addressed by
highly sophisticated techniques which are not suitable for large scale
integration in macroscopic circuits. We present an optical lithography method
that allows for the fabrication of a network of electrodes which are separated
by gaps of controlled nanometer size. The main idea is to control the gap size
with subnanometer precision using a structure grown by molecular beam epitaxy.
