  Surface morphology of size-selected silver nanocluster films grown by dc
magnetron sputtering has been investigated by means of an atomic force
microscopy (AFM). From the height-height correlation functions ( HHCF) obtained
from corresponding AFM images, the scaling exponents are calculated and two
types of growth regimes have been observed. In the first regime, the growth
exponent is found to be \b{eta}1 = 0.27\pm0.07 close to the KPZ growth
exponent, while in the second growth regime shadowing effect plays dominant
role which gives the growth exponent value \b{eta}2 = 0.88\pm0.28. On the other
hand for the whole deposition regime, the roughness exponent value is found to
be constant around {\alpha}= 0.76\pm0.02. UV-vis spectroscopy measurement
suggests how the average reflectance of the film surface changes with different
growth times.
