  The effect of substrate bias and surface gate voltage on the low temperature
resistivity of a Si-MOSFET is studied for electron concentrations where the
resistivity increases with increasing temperature. This technique offers two
degrees of freedom for controlling the electron concentration and the device
mobility, thereby providing a means to evaluate the relative importance of
electron-electron interactions and disorder in this so-called ``metallic''
regime. For temperatures well below the Fermi temperature, the data obey a
scaling law where the disorder parameter ($k_{\rm{F}}l$), and not the
concentration, appears explicitly. This suggests that interactions, although
present, do not alter the Fermi-liquid properties of the system fundamentally.
Furthermore, this experimental observation is reproduced in results of
calculations based on temperature-dependent screening, in the context of
Drude-Boltzmann theory.
