  We propose a novel technique for the magnetoplasmonic nanostructures
fabrication based on the pulse force nanolithography method. It allows one to
create the high-quality magnetoplasmonic nanostructures that have lower total
losses than the gratings made by the electron beam lithography. The method
provides control of the SPP excitation efficiency by varying the grating
parameters such as the scratching depth or the number of the scratches in a
single period. The quality of the plasmonic gratings was estimated by means of
the transverse magneto-optical Kerr effect that is extremely sensitive to the
finesse of a plasmonic structure.
