  We propose a novel scheme for the lithography of arbitrary, two-dimensional
nanostructures via matter-wave interference. The required quantum control is
provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens
system. The lens system is developed such that it allows simultaneous control
over atomic wave-packet spatial extent, trajectory, and phase signature. We
demonstrate arbitrary pattern formations with two-dimensional 87Rb wavepackets
through numerical simulations of the scheme in a practical parameter space.
Prospects for experimental realizations of the lithography scheme are also
discussed.
