  A systematic review, covering fabrication of nanoscale patterns by laser
interference lithography (LIL) and their applications for optical devices are
provided. LIL is a patterning method with simple, quick process over a large
area without using a mask. LIL is a powerful technique for the definition of
large-area, nanometer-scale, periodically patterned structures. Patterns are
recorded in a light-sensitive medium that responds nonlinearly to the intensity
distribution associated with the interference of two or more coherent beams of
light. The photoresist patterns produced with LIL are the platform for further
fabrication of nanostructures and growth of functional materials which are the
building blocks for devices. Demonstration of optical and photonic devices by
LIL is reviewed such as directed nano photonics and surface plasmon resonance
(SPR) or large area membrane reflectors and anti-reflectors. Perspective on
future directions for LIL and emerging applications in other fields are
presented.
