  The experimental research on the nature of diffusion by the Mo substrate
atoms into the Ti and Cr deposited thin films is completed by the secondary
ion-ion emission method. In [1], the initial stage of the Ti thin film on the
Mo substrate deposition process, using the Ti evaporation technique in the
vacuum, is researched. It was found that the Mo substrate atoms diffuse into
the continuously deposited Ti thin film. The diffusion of Mo substrate atoms by
the nodes of crystal grating in the deposited metallic Ti thin film with the
continuously increasing thickness is theoretically considered in [2]. In this
research, the diffusion coefficients of Mo substrate atoms into the Ti and Cr
thin films are measured by the secondary ion-ion emission method in the Mo-Ti
and Mo-Cr systems.
