  Pulsed laser deposition (PLD) is a popular growth method, which has been
successfully used for fabricating thin films. Compared to continuous deposition
(like molecular beam epitaxy) the pulse intensity can be used as an additional
parameter for tuning the growth behavior, so that under certain circumstances
PLD improves layer-by-layer growth. We present kinetic Monte-Carlo simulations
for PLD in the submonolayer regime and give a description of the island
distance versus intensity. Furthermore we discuss a theory for second layer
nucleation and the impact of Ehrlich-Schwoebel barriers on the growth behavior.
We find an exact analytical expression for the probability of second layer
nucleation during one pulse for high Ehrlich-Schwoebel barriers.
