  Ag atoms have been deposited on 3x3 silicene and R3xR3 silicene films by
molecular beam epitaxy method in ultrahigh vacuum. Using scanning tunneling
microscopy and Raman spectroscopy, we found that Ag atoms do not form chemical
bonds with both 3x3 silicene and R3xR3 silicene films,which is due to
chemically inert surface of silicene. On 3x3 silicene films, Ag atoms mostly
form into stable flat top Ag islands. In contrast, Ag atoms form nanoclusters
and glide on silicene films, suggesting more inert nature. Raman spectroscopy
suggests that there is more sp2 hybridization in R3xR3 than in
R7xR7/3x3silicene films
