  We present the results of multi-objective genetic algorithm optimizations of
a potential single shot ultra fast electron diffraction beamline utilizing a
100 MV/m 1.6 cell normal conducting rf (NCRF) gun, as well as a 9 cell 2pi/3
bunching cavity placed between two solenoids. Optimizations of the transverse
projected emittance as a function of bunch charge are presented and discussed
in terms of the scaling laws derived in the charge saturation limit.
Additionally, optimization of the transverse coherence length as a function of
final rms bunch length at the sample location have been performed for a charge
of 1e6 electrons. Analysis of the solutions is discussed, as are the effects of
disorder induced heating. In particular, for a charge of $10^6$ electrons and
final beam size greater than or equal to 25 microns, we found a relative
coherence length of 0.07, 0.1, and 0.2 nm/micron for a final bunch length of
approximately 5, 30, and 100 fs, respectively. These results demonstrate the
viability of using genetic algorithms in the design and operation of ultrafast
electron diffraction beamlines.
