  The successful application of titanium oxide-graphene hybrids in the fields
of photocatalysis, photovoltaics and photodetection strongly depends on the
interfacial contact between both materials. The need to provide a good coupling
between the enabling conductor and the photoactive phase prompted us to
directly grow conducting graphenic structures on TiO2 crystals. We here report
on the direct synthesis of tailored graphenic structures by using Plasma
Assisted Chemical Vapour Deposition that present a clean junction with the
prototypical titanium oxide (110) surface. Chemical analysis of the interface
indicates chemical bonding between both materials. Photocurrent measurements
under UV light illumination manifest that the charge transfer across the
interface is efficient. Moreover, the influence of the synthesis atmosphere,
gas precursor (C2H2) and diluents (Ar, O2), on the interface and on the
structure of the as-grown graphenic material is assessed. The inclusion of O2
promotes vertical growth of partially oxidized carbon nanodots/rods with
controllable height and density. The deposition with Ar results in continuous
graphenic films with low resistivity (6.8x10-6 ohm x m). The synthesis
protocols developed here are suitable to produce tailored carbon-semiconductor
structures on a variety of practical substrates as thin films, pillars or
nanoparticles.
