  Electrodeposition of tantalum thin coating was attempted from a room
temperature ionic liquid, BMP[Tf2N] in presence of dissolved TaF5 and LiF. The
influence of deposition parameters, such as ionic liquid composition, substrate
type, electrical potential or temperature upon structure and composition was
observed. Cyclic voltammetry, scanning transmission electron microscopy (STEM)
in conjunction with energy dispersive X-ray analysis (EDX), X-ray photoelectron
spectroscopy (XPS), as well as X-ray diffraction (XRD) techniques were applied.
The reversibility of the reduction processes was examined, and comparison made
to deposition from molten salt systems.
