  This paper explores methods to enhance the reproducibility of Josephson
junctions, crucial elements in superconducting quantum technologies, when
employing the Dolan technique in 30 kV e-beam processes. The study explores the
influence of dose distribution along the bridge area on reproducibility,
addressing challenges related to fabrication sensitivity. Experimental methods
include E-beam lithography, with electron trajectory simulations shedding light
on backscattered electron behavior. We demonstrate the fabrication of different
junction geometries, revealing that some geometries significantly improve
reproducibility by resulting in a more homogeneous dose distribution over the
junction area.
