  A new approach to simulation of stationary flows by Direct Simulation Monte
Carlo method is proposed. The idea is to specify an individual time step for
each component of a gas mixture. The approach consists of modifications mainly
to collision phase and recommendation on choosing time step ratios. It allows
softening the demands on the computational resources for cases of disparate
collision diameters of molecules and/or disparate molecular masses. These are
the cases important in vacuum deposition technologies. Few tests of the new
approach are made. Finally, the usage of new approach is demonstrated on a
problem of silver nanocluster diffusion in carrier gas argon in conditions of
silver deposition experiments.
