  We explore the intimate relationship between quantum lithography,
Heisenberg-limited parameter estimation and the rate of dynamical evolution of
quantum states. We show how both the enhanced accuracy in measurements and the
increased resolution in quantum lithography follow from the use of
entanglement. Mathematically, the hyperresolution of quantum lithography
appears naturally in the derivation of Heisenberg-limited parameter estimation.
We also review recent experiments offering a proof of principle of quantum
lithography, and we address the question of state preparation and the
fabrication of suitable photoresists.
