  Dissociative electron attachment (DEA) and ion-pair dissociation (IPD)
processes of Difluoromethane (CH$_2$F$_2$) have been studied in the incident
electron energy range 0 to 45 eV. Three different fragment anions (F$^-$,
CHF$^-$ and F$_2^-$) are detected in the DEA range and two anions (F$^-$ and
CHF$^-$) are detected in IPD range. Absolute cross-section of the F$^-$
fragment ion is measured for the first time. Three different resonances for
both F$^-$ and CHF$^-$ ions and one single resonance peak for the F$_2^-$ ions
are observed. Constant increase in ion counts above 8 eV incident electron
energy indicates the involvement of IPD process. From the experimental
observation, it is speculated that near 11 eV incident electron energy both DEA
and IPD processes occur simultaneously.
