  Polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) monoliths containing
regular arrays of macropores (diameter ~1.1 microns, depth ~700 nm) at their
surfaces are used to pattern substrates by patterning modes going beyond the
functionality of classical solid elastomer stamps. In a first exemplary
application, the macroporous PS-b-P2VP monoliths are employed as sacrificial
templates for the deposition NaCl nanocrystals and topographically patterned
iridium films. One NaCl nanocrystal per macropore is formed by evaporation of
NaCl solutions filling the macropores followed by iridium coating. Thermal
PS-b-P2VP decomposition yields topographically patterned iridium films
consisting of ordered arrays of hexagonal cells, each of which contains one
NaCl nanocrystal. For the second exemplary application, spongy-continuous
mesopore systems are generated in the macroporous PS-b-P2VP monoliths by
selective-swelling induced pore generation. Infiltrating the spongy-continuous
mesopore systems with ink allows capillary microstamping of continuous ink
films with holes at the positions of the macropores onto glass slides
compatible with advanced light microscopy. Capillary microstamping can be
performed multiple times under ambient conditions without re-inking and without
quality deterioration of the stamped patterns. The macroporous PS-b-P2VP
monoliths are prepared by double replication of primary macroporous silicon
molds via secondary polydimethylsiloxane molds.
