  We study the focusing of atoms by multiple layers of standing light waves in
the context of atom lithography. In particular, atomic localization by a
double-layer light mask is examined using the optimal squeezing approach.
Operation of the focusing setup is analyzed both in the paraxial approximation
and in the regime of nonlinear spatial squeezing for the thin-thin as well as
thin-thick atom lens combinations. It is shown that the optimized double light
mask may considerably reduce the imaging problems, improve the quality of
focusing and enhance the contrast ratio of the deposited structures.
