  Plasmas generated using energetic electron beams are well known for their low
electron temperature ($T_{e}$) and plasma potential, which makes them
attractive for atomic-precision plasma processing applications such as atomic
layer etch and deposition. A 2d3v particle-in-cell (PIC) model for an electron
beam-generated plasma in argon confined by a constant applied magnetic field is
described in this article. Plasma production primarily occurs in the path of
the beam electrons in the center of the chamber. The resulting plasma spreads
out in the chamber through non-ambipolar diffusion with a short-circuit effect
allowing unequal electron and ion fluxes to different regions of the bounding
conductive chamber walls. The cross-field transport of the electrons (and thus
the steady-state characteristics of the plasma) are strongly impacted by the
magnetic field. $T_{e}$ is anisotropic in the electron beam region, but low and
isotropic away from the plasma production zone. The plasma density increases,
and the plasma becomes more confined near the region of production when the
magnetic field strengthens. The magnetic field reduces both electron physical
and energy transport perpendicular to the magnetic field. $T_{e}$ is uniform
along the magnetic field lines and slowly decreases perpendicular to it.
Electrons are less energetic in the sheath regions where the sheath electric
field repels and confines the low-energy electrons from the bulk plasma. Even
though electron and ion densities are similar in the bulk plasma due to
quasi-neutrality, electron and ion fluxes on the grounded chamber walls are
unequal at most locations. Electron confinement by the magnetic field weakens
with increasing pressure, and the plasma spreads out farther from the electron
beam region.
