  For a collisionless plasma in contact with a dielectric surface, where with
unit probability electrons and ions are, respectively, absorbed and
neutralized, thereby injecting electrons and holes into the conduction and
valence band, we study the kinetics of plasma loss by nonradiative
electron-hole recombination inside the dielectric. We obtain a
self-consistently embedded electric double layer, merging with the
quasi-neutral, field-free regions inside the plasma and the solid. After a
description of the numerical scheme for solving the two sets of Boltzmann
equations, one for the electrons and ions of the plasma and one for the
electrons and holes of the solid, to which this transport problem gives rise
to, we present numerical results for a p-doped dielectric. Besides potential,
density, and flux profiles, plasma-induced changes in the electron and hole
distribution functions are discussed, from which a microscopic view on plasma
loss inside the dielectric emerges.
