  Phase formation and transitions in platinum silicide films on polycrystalline
Si in the process of Pt magnetron sputtering and heat treatments at different
temperatures are studied using X-ray photoelectron spectroscopy,
high-resolution transmission electron microscopy and X-ray diffractometry.
Phases of amorphous and polycrystalline Pt$_3$Si and Pt$_2$Si are shown to form
during the room-temperature Pt deposition on poly-Si beneath the Pt layer. The
relaxation of the interfacial film and partial transformation of Pt$_3$Si into
Pt$_2$Si occurs as a result of the thermal treatment for 30 minutes in the
temperature range from 125 to 300$^{\circ}$C. The Pt$_3$Si and Pt$_2$Si phases
crystallize to PtSi due to annealing at the temperatures from 320 to
480$^{\circ}$C for the same time period.
