  The induction heating is a common method applied in metalorganic vapor phase
epitaxy (MOVPE) especially for higher-temperature growth conditions. However,
compared to the susceptor heated by the multiple-zone resistant heater, the
inductive-heated susceptor could suffer from severe thermal non-uniformity
issue. In this simulation study, we propose to employ a T-shape susceptor
design with various geometric modifications to significantly improve the
substrate temperature uniformity by manipulating thermal transfer.
Specifically, the thermal profile can be tailored by horizontal expansion and
vertical elongation of the susceptor, or forming a cylindrical hollow structure
at the susceptor bottom cylinder. Three optimized designs are shown with
different temperature uniformity as well as various induction heating
efficiencies. The temperature variation of the entire substrate surface can be
less than 5 {\deg}C at ~1900 {\deg}C with high induction heating efficiency
after applying the proposed techniques.
