  We introduce a novel nanofabrication technique to directly deposit catalyst
pads for the chemical vapor deposition synthesis of single-walled carbon
nanotubes (SWCNTs) at any desired position on a substrate by Gallium focused
ion beam (FIB) induced deposition of silicon oxide thin films from the
metalorganic Tetraethyl orthosilicate (TEOS) precursor. A high resolution in
the positioning of the SWCNTs is naturally achieved as the imaging and
deposition by FIB are conducted concurrently in situ at the same selected point
on the substrate. This technique has substantial advantages over the current
state-of-the-art methods that are based on complex and multistep lithography
processes.
