  Pulsed laser deposition from a Nd:YAG laser was employed in production of
hundreds of nanometer thick quasicrystalline Ti-Zr-Ni films on glass substrate.
The influence of deposition temperature Ts on the structure, morphology and
microstructure of the films across their thickness was investigated. The
morphology and microstructure features were evaluated by X-ray diffraction and
transmission electron microscopy techniques. The low deposition temperatures
were found to produce films with nanometer sized grains embedded in an
amorphous matrix. The grains exhibit quasicrystalline order. The higher
deposition temperatures lead to films whose structure is not uniform all along
the growth direction. The layer in contact with the substrate is a very thin
amorphous layer. The main part of the film consists of crystallized columns.
The columns have grown from a nano-crystallized layer where the size of
crystallites increases with increasing thickness.
