  Using field theoretic renormalization, an MBE-type growth process with an
obliquely incident influx of atoms is examined. The projection of the beam on
the substrate plane selects a "parallel" direction, with rotational invariance
restricted to the transverse directions. Depending on the behavior of an
effective anisotropic surface tension, a line of second order transitions is
identified, as well as a line of potentially first order transitions, joined by
a multicritical point. Near the second order transitions and the multicritical
point, the surface roughness is strongly anisotropic. Four different roughness
exponents are introduced and computed, describing the surface in different
directions, in real or momentum space. The results presented challenge an
earlier study of the multicritical point.
