  Diamond is one of the hardest and most difficult to polish materials. In this
paper, the polishing of {111} and {100} single crystal diamond surfaces by
standard Chemical Mechanical Polishing, as used in the silicon industry, is
demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with
Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A
reduction in roughness from 0.92 to 0.23 nm root mean square (RMS) and 0.31 to
0.09 nm RMS for {100} and {111} samples respectively was observed.
