  In this work, we studied phase formation, structural and magnetic properties
of iron-nitride (Fe-N) thin films deposited using high power impulse magnetron
sputtering (HiPIMS) and direct current magnetron sputtering (dc-MS). The
nitrogen partial pressure during deposition was systematically varied both in
HiPIMS and dc-MS. Resulting Fe-N films were characterized for their
microstructure, magnetic properties and nitrogen concentration. We found that
HiPIMS deposited Fe-N films show a globular nanocrystalline microstructure and
improved soft magnetic properties. In addition, it was found that the nitrogen
reactivity impedes in HiPIMS as compared to dc-MS. Obtained results can be
understood in terms of distinct plasma properties of HiPIMS.
