  Surface topology measurements of micro- or nanostructures is essential for
both scientific and industrial applications. However, high-throughput
measurements remain challenging in surface metrology. We present a single-shot
full-field surface topography measurement using Kramers-Kronig holographic
imaging and spectral multiplexing. Three different intensity images at
different incident angles were simultaneously measured with three different
colors, from which a quantitative phase image was retrieved using spatial
Kramers-Kronig relations. A high-resolution topographic image of the sample was
then reconstructed using synthetic aperture holography. Various patterned
structures at the nanometer scale were measured and cross-validated using
atomic force microscopy.
