  We propose a method for deterministic implantation of single atoms into
solids which relies on a linear ion trap as an ion source. Our approach allows
a deterministic control of the number of implanted atoms and a spatial
resolution of less than 1 nm. Furthermore, the method is expected to work for
almost all hemical elements. The deterministic implantation of single phosphor
or nitrogen atoms is interesting for the fabrication of scalable solid state
quantum computers, in particular for silicon and diamond based schemes. A wide
range of further applications is expected for the fabrication of nano and
sub-nano electric devices.
