  Mercury-Sensitized Photo-Assisted Chemical Vapor Deposition (Hg-Photo-CVD)
technique opens new possibilities for reducing thin film growth temperature and
producing novel semiconductor materials suitable for the future generation of
high efficiency thin film solar cells onto low cost flexible plastic
substrates. This paper provides some experimental data resulting from the
optical characterization of hydrogenated amorphous silicon thin films grown by
this deposition technique. Experiments have been performed on both as-deposited
layers and thermal annealed ones.
  Keywords: Photovoltaic, Solar Cell, Thin films, Nano-Crystalline Silicon,
Hydrogenated Amorphous Silicon, Optical Properties, Thermal Annealing PACS
Numbers: 68.60.Dv, 78.66.Jg, 78.66.-w, 73.50.Pz, 81.15.-z, 84.60.Jt
