  We introduce analytical expressions for a pseudo fully analytical elliptical
projected Navarro, Frenk & White (NFW) mass profile to be used in lensing
equations. We propose a formalism that incorporates the ellipticity into the
expression for the lens potential, producing a pseudo-elliptical mass
distribution. This approach can be implemented to any circular mass profile for
which the projected mass profile Sigma(r) and the deflection angle profile
alpha(r) both have analytical expressions; however the potential does not
necessarily need to take an analytical form. We apply this new formalism to the
NFW mass distribution and study how well this pseudo-elliptical NFW model
describes an elliptical mass distribution. We conclude that the
pseudo-elliptical NFW model is a good description of elliptical mass
distributions provided that the ellipticity of the projected mass distribution
is <~ 0.4, although with a slightly boxy distribution.
