  For injection of beams into circular machines with different horizontal and
vertical emittance acceptance, the injection efficiency can be increased if
these beams are flat, i.e. if they feature unequal transverse emittances.
Generation of flat electron beams is well known and has been demonstrated
already in beam experiments. It was proposed also for ion beams that were
generated in an Electron Cyclotron-Resonance (ECR) source. We introduce an
extension of the method to beams that underwent charge state stripping without
requiring their generation inside an ECR source. Results from multi-particle
simulations are presented to demonstrate the validity of the method.
