  Multiple patterning lithography has been widely adopted in advanced
technology nodes of VLSI manufacturing. As a key step in the design flow,
multiple patterning layout decomposition (MPLD) is critical to design closure.
Due to the NP-hardness of the general decomposition problem, various efficient
algorithms have been proposed with high quality solutions. However, with
increasingly complicated design flow and peripheral processing steps,
developing a high-quality layout decomposer becomes more and more difficult,
slowing down the further advancement in this field. This paper presents OpenMPL
[1], an open-source layout decomposition framework, with well-separated
peripheral processing and the core solving steps. We demonstrate the
flexibility of the framework with efficient implementations of various
state-of-the-art algorithms, which enable us to reproduce most of the recent
results on widely-recognized benchmarks. We believe OpenMPL can pave the road
for developing layout decomposition engines and stimulate further researches on
this problem.
