  Epitaxial copper thin films were deposited by magnetron sputtering. The
adatoms during deposition are influenced by deposition parameters which cause
variations in thin film properties. XRD and FESEM studies were done to get an
insight into the growth mechanisms of the films. A modeling has been done on
the epitaxial thin film growth with sputtering process. The parameters during
sputtering like, sputtering yield, pressure, temperature, current density,
deposition time were related and an attempt has been made to analyze the
sputtering process.
