  The celebrated electronic properties of graphene have opened way for
materials just one-atom-thick to be used in the post-silicon electronic era. An
important milestone was the creation of heterostructures based on graphene and
other two-dimensional (2D) crystals, which can be assembled in 3D stacks with
atomic layer precision. These layered structures have already led to a range of
fascinating physical phenomena, and also have been used in demonstrating a
prototype field effect tunnelling transistor - a candidate for post-CMOS
technology. The range of possible materials which could be incorporated into
such stacks is very large. Indeed, there are many other materials where layers
are linked by weak van der Waals forces, which can be exfoliated and combined
together to create novel highly-tailored heterostructures. Here we describe a
new generation of field effect vertical tunnelling transistors where 2D
tungsten disulphide serves as an atomically thin barrier between two layers of
either mechanically exfoliated or CVD-grown graphene. Our devices have
unprecedented current modulation exceeding one million at room temperature and
can also operate on transparent and flexible substrates.
