  Thin, uniform arsenic targets suitable for high-fidelity cross section
measurements in stacked-target experiments were prepared by electrodeposition
of arsenic on titanium backings from aqueous solutions. Electrolytic cells were
constructed and capable of arsenic deposits ranging in mass from approximately
1$\unicode{x2013}$29 mg (0.32$\unicode{x2013}$7.2 mg/cm$^2$,
0.57$\unicode{x2013}$13 $\mu$m). Examination of electrodeposit surface
morphology by scanning electron microscopy and microanalysis was performed to
investigate the uniformity of produced targets. Brief studies of plating growth
dynamics and structural properties through cyclic voltammetry were also
undertaken. Alternative target fabrication approaches by vapor deposition and
electrodeposition from a deep eutectic solvent were additionally conducted. We
further introduce a non-destructive characterization method for thin targets by
neutron activation, which is independent of neutron flux shape, environmental
factors, and source geometry, while correcting for any potential scatter or
absorption effects.
