  A novel route for the synthesis of large area graphene by an indigenously
built electron cyclotron resonance (ECR) plasma enhanced chemical vapor
deposition (PECVD) setup has been reported in this work. A unique 2.45 GHz
permanent magnet type ECR PECVD system has been designed and developed for the
growth of various nano-structures and films. The apparatus has a unique
advantage to synthesize large area graphene at much lower additional substrate
heating than heat supplied by an external oven in conventional thermal CVD
method. A major amount of heat is supplied here by ECR plasma. Polycrystalline
copper foil is used here as a catalytic substrate which is pre annealed inside
resonant hydrogen plasma prior to its exposure under precursor gaseous plasma
inside the ECR PECVD reactor. Methane is used as carbon precursor along with
hydrogen as carrier gas. Argon gas is used for the rapid cooling of the
substrate maintaining suitable thermodynamic condition favorable for graphene
synthesis. The synthesis process has been carried out by controlling growth
temperature, total pressure and synthesis time at various gas ratios. The
exposed copper foil has been characterized by Raman spectroscopy to investigate
the quality of synthesized graphene in the home made reactor.
