  Recent interest in structure solution and refinement using electron
diffraction (ED) has been fuelled by its inherent advantages when applied to
crystals of sub-micron size, as well as a better sensitivity to light elements.
Currently, data is often processed using software written for X-ray
diffraction, using the kinematic theory of diffraction to generate model
intensities -- despite the inherent differences in diffraction processes in ED.
Here, we use dynamical Bloch-wave simulations to model continuous rotation
electron diffraction data, collected with a fine angular resolution (crystal
orientations of $\sim0.1^\circ$). This fine-sliced data allows us to reexamine
the corrections applied to ED data. We propose a new method for optimising
crystal orientation, and take into account the angular range of the incident
beam and varying slew rate. We extract observed integrated intensities and
perform accurate comparisons with simulations using rocking curves for a (110)
lamella of silicon 185~nm in thickness. $R_1$ is reduced from $26\%$ with the
kinematic model to $6.8\%$ using dynamical simulations.
