  An iterative algorithm based on Monte Carlo method is used to model thin film
growth of AB type molecule and crystallization. Primarly, PVD technique is
investigated since it is one of the most preferred on thin film growth
processes. The formation of thin film has been simulated for a cubic region
with 10000 A type and 10000 B type atoms. Up to third nearest neighboring cells
have been taken into account to realize the inter-atomic interactions.
Boltzmann statistics is used to deal temperature effect by treating both A and
B atoms as classical particles. The proposed substrate with the same crystal
structure of the film was simulated by fixing the first layer of the film as
having a perfect crystal structure. Roughness of the film surface is analyzed
by sampling the RMS (Root mean square roughness) parameter both analytically
and visually.
