  A magnetron sputtering method for the production of thin-film libraries with
a spatially varying composition, x, in Bi2Sr2Ca1-xYxCu2Oy (0<=x<=0.5) has been
developed. Two targets with a composition of Bi2Sr2YCu2O_{8.5 + \delta} and
Bi_2Sr_2CaCu_2O_{8 + \delta} are co-sputtered with appropriate masks. The
target masks produce a linear variation in opposite, but co-linear radial
direction, and the rotation speed of the substrate table is sufficient to
intimately mix the atoms. EDS/WDS composition studies of the films show a
depletion of Sr and Bi that is due to oxygen anion resputtering. The depletion
is most pronounced at the centre of the film (i.e. on-axis with the target) and
falls off symmetrically to either side of the 75 mm substrate. At either edge
of the film the stoichiometry matches the desired ratios. Using a 12 mTorr
process gas of argon and oxygen in a 2:1 ratio, the strontium depletion is
corrected. The bismuth depletion is eliminated by employing a rotating carbon
brush apparatus which supplies a -20 V DC bias to the sample substrate. The
negative substrate bias has been used successfully with an increased chamber
pressure to eliminate the resputtering effect across the film. The result is a
thin film composition spread library with the desired stoichiometry.
