  We report the first observation of substitutional silicon atoms in
single-layer hexagonal boron nitride (h-BN) using aberration corrected scanning
transmission electron microscopy (STEM). The medium angle annular dark field
(MAADF) images reveal silicon atoms exclusively filling boron vacancies. This
structure is stable enough under electron beam for repeated imaging. Density
functional theory (DFT) is used to study the energetics, structure and
properties of the experimentally observed structure. The formation energies of
all possible charge states of the different silicon substitutions
(Si$_\mathrm{B}$, Si$_\mathrm{N}$ and Si$_\mathrm{{BN}}$) are calculated. The
results reveal Si$_\mathrm{B}^{+1}$ as the most stable substitutional
configuration. In this case, silicon atom elevates by 0.66{\AA} out of the
lattice with unoccupied defect levels in the electronic band gap above the
Fermi level. The formation energy shows a slightly exothermic process. Our
results unequivocally show that heteroatoms can be incorporated into the h-BN
lattice opening way for applications ranging from single-atom catalysis to
atomically precise magnetic structures.
