  Transport plays a key role in characterizing topological insulators and
semimetals. Understanding the effect of disorder is crucial to assess the
robustness of experimental signatures for topology. In this work, we find the
absence of localization in nodal line semimetals for long-range scalar disorder
and a large range of disorder strengths. Using a continuum transfer matrix
approach, we find that the conductivity in the plane and out of the plane of
the nodal line increases with system size and disorder strength. We
substantiate these findings by a perturbative calculation and show that the
conductivity increases with disorder strength using the Kubo formula in the
self-consistent Born approximation. We also find that the system remains
metallic for vector disorder and that vector disorder can drive a transition
from an insulating to a metallic regime. Our results demonstrate the absence of
localization in a bulk system.
