  We have reported nanopattern formation on carbon thin film and Si(100)
surfaces by low energy inert and carbon ion beams. It is interesting to observe
the role of carbon as target as well as projectile for nano patterning. Using
carbon thin film as target, nano patterns of carbon are formed by inert (Ar+)
and self (C+) ion bombardment, whereas carbon ion beam is used to form well
ordered Si nano ripple structure in a cost effective way where implanted carbon
plays an important role to form Si ripple in relatively lower fluence than the
inert projectile.
