  Transmission electron microscopy, scanning transmission electron tomography,
and electron energy loss spectroscopy were used to characterize
three-dimensional artificial Si nanostructures called "metalattices", focusing
on Si metalattices synthesized by high-pressure confined chemical vapor
deposition in 30-nm colloidal silica templates with ~7 and ~12 nm "meta-atoms"
and ~2 nm "meta-bonds". The "meta-atoms" closely replicate the shape of the
tetrahedral and octahedral interstitial sites of the face-entered cubic
colloidal silica template. Composed of either amorphous or nanocrystalline
silicon, the metalattice exhibits long-range order and interconnectivity in
two-dimensional micrographs and three-dimensional reconstructions. Electron
energy loss spectroscopy provides information on local electronic structure.
The Si L2,3 core-loss edge is blue-shifted compared to the onset for bulk Si,
with the meta-bonds displaying a larger shift (0.55 eV) than the two types of
meta-atoms (0.30 and 0.17 eV). Local density of state calculations using an
empirical tight binding method are in reasonable agreement.
