  Finding affordable ways of generating high-density ordered nanostructures
that can be transferred to a substrate is a major challenge for industrial
applications like memories or optical devices with high resolution features. In
this work, we report on a novel technique to direct self-assembled structures
of block copolymers by NanoImprint Lithography. Surface energy of a reusable
mold and nanorheology are used to organize the copolymers in defect-free
structures over tens of micrometers in size. Versatile and controlled in-plane
orientations of about 25 nm half-period lamellar nanostructures are achieved
and, in particular, include applications to circular tracks of magnetic reading
heads.
