  A combination of high-resolution x-ray diffraction and a new technique of
x-ray standing wave uorescence at grazing incidence is employed to study the
structure of (Ga,Mn)As diluted magnetic semiconductor and its changes during
post-growth annealing steps. We find that the film is formed by a uniform,
single crystallographic phase epilayer covered by a thin surface layer with
enhanced Mn concentration due to Mn atoms at random non-crystallographic
positions. In the epilayer, Mn incorporated at interstitial position has a
dominant effect on lattice expansion as compared to substitutional Mn. The
expansion coeffcient of interstitial Mn estimated from our data is consistent
with theory predictions. The concentration of interstitial Mn and the
corresponding lattice expansion of the epilayer are reduced by annealing,
accompanied by an increase of the density of randomly distributed Mn atoms in
the disordered surface layer. Substitutional Mn atoms remain stable during the
low-temperature annealing.
