  The intrinsic stress in nanomultilayers (NMLs) is typically dominated by
interface stress, which is particularly high in immiscible Cu/W NMLs. Here,
atomistic simulations with a chemically-accurate neural network potential
reveal the role of interfacial intermixing and metastable phase formation on
the interface stress levels. These results rationalize an
experimentally-reported compressive- to-tensile transition as a function of NML
deposition conditions and the extremely high interface stresses under some
conditions.
