  The technology of wet etching allowing fabrication of standalone BiSrCaCuO
mesa structures was proposed. The produced mesas can be produced much thicker
than ones usually being studied. The time required for the fabrication is much
smaller in comparison with the standard method of ion milling. The process used
is controllable which provides acceptable precision of mesa fabrication. The
current-voltage characteristics of the sample showing Josephson nature were
obtained. The qualitative comparison with characteristics of similar structures
fabricated by other groups was carried out.
