  High quality ZnO thin films were gown using the pulsed laser deposition
technique on (0001) Al$_2$O$_3$ substrates in an oxidizing atmosphere, using a
Zn metallic target. We varied the growth conditions such as the deposition
temperature and the oxygen pressure. First, using a battery of techniques such
as x-rays diffraction, Rutherford Backscattering spectroscopy and atomic force
microscopy, we evaluated the structural quality, the stress and the degree of
epitaxy of the films. Second, the relations between the deposition conditions
and the structural properties, that are directly related to the nature of the
thin films, are discussed qualitatively. Finally, a number of issues on how to
get good-quality ZnO films are addressed.
