  Liquid photoresists are abundant in the field of light-based additive
manufacturing (AM). However, printing unsupported directly into a vat of
material in emerging volumetric AM technologies$-$typically a benefit due to
fewer geometric constraints and less material waste$-$can be a limitation when
printing low-viscosity liquid monomers and multimaterial constructs due to part
drift or sedimentation. With ethyl cellulose (EC), a thermoplastic soluble in
organic liquids, we formulate a simple three-component transparent
thermoreversible gel photoresist with melting temperature of ~64 $\deg$C. The
physically crosslinked network of the gel leads to storage moduli in the range
of 0.1$-$10 kPa and maximum yield stress of 2.7 kPa for a 10 wt$\%$ EC gel
photoresist. Non-zero yield stress enables sedimentation-free tomographic
volumetric patterning in low-viscosity monomer without additional hardware or
modification of apparatus. Additionally, objects inserted into the print
container can be suspended in the gel material which enables overprinting of
multimaterial devices without anchors connecting the object to the printing
container. Flexural strength is also improved by 100% compared to the neat
monomer for a formulation with 7 wt$\%$ EC.
