  The dielectric breakdown approach for forming nanopores has greatly
accelerated the pace of research in solid-state nanopore sensing, enabling
inexpensive formation of nanopores via a bench top setup. Here we demonstrate
the potential of tip controlled dielectric breakdown (TCLB) to fabricate pores
100$\times$ faster, with high scalability and nanometre positioning precision.
A conductive atomic force microscope (AFM) tip is brought into contact with a
nitride membrane positioned above an electrolyte reservoir. Application of a
voltage pulse at the tip leads to the formation of a single nanoscale pore.
Pores are formed precisely at the tip position with a complete suppression of
multiple pore formation. In addition, our approach greatly accelerates the
electric breakdown process, leading to an average pore fabrication time on the
order of 10 ms, at least 2 orders of magnitude shorter than achieved by classic
dielectric breakdown approaches. With this fast pore writing speed we can
fabricate over 300 pores in half an hour on the same membrane.
