  Si/Ge heteroepitaxial dots under tensile strain are grown on nanostructured
Ge substrates produced by high-temperature flash heating exploiting the
spontaneous faceting of the Ge(001) surface close to the onset of surface
melting. A very diverse growth mode is obtained depending on the specific
atomic structure and step density of nearby surface domains with different
vicinal crystallographic orientations. On highly-miscut areas of the Ge(001)
substrate, the critical thickness for islanding is lowered to about 5 ML, in
contrast to the 11 ML reported for the flat Ge(001) surface, while on
unreconstructed (1x1) domains the growth is Volmer-Weber driven. An explanation
is proposed considering the diverse relative contributions of step and surface
energies on misoriented substrates. In addition, we show that the bottom-up
pattern of the substrate naturally formed by thermal annealing determines a
spatial correlation for the dot sites.
