  A Cooper pair insulator (CPI) phase emerges near the superconductor-insulator
transitions of a number of strongly-disordered thin film systems. Much recent
study has focused on a mechanism driving the underlying Cooper pair
localization. We present data showing that a CPI phase develops in amorphous
Pb$_{0.9}$Bi$_{0.1}$ films deposited onto nano-porous anodized aluminum oxide
surfaces just as it has been shown to develop for a-Bi films. This result
confirms the assertion that the CPI phase emerges due to the structure of the
substrate. It supports the picture that nanoscale film thickness variations
induced by the substrate drive the localization. Moreover, it implies that the
CPI phase can be induced in any superconducting material that can be deposited
onto this surface.
