  A novel technique is reported to improve the resolution of two-photon direct
laser writing lithography. Thanks to the high collimation enabled by
extraordinary $\varepsilon_{NZ}$ (near-zero) metamaterial features, ultra-thin
dielectric hyper resolute nanostructures are within reach. With respect to the
standard direct laser writing approach, a size reduction of $89\%$ and $50\%$ ,
in height and width respectively, is achieved with the height of the structures
adjustable between 5nm and 50nm. The retrieved 2D fabrication parameters are
exploited for fabricating hyper resolute 3D structures. In particular, a highly
detailed dielectric bas-relief (500 nm of full height) of Da Vinci's
\textit{"Lady with an Ermine"} has been realized. The proof-of-concept result
shows intriguing cues for the current and trendsetting research scenario in
anti-counterfeiting applications, flat optics and photonics.
