  In-situ monitoring and calibration of nano-sculptured thin film thickness is
a critical problem due to substrate tilt angle dependent porosity and mass
flux. In this letter we present an analytical model for thickness dependence on
fabrication parameters for nano-sculptured films. The generality of the model
includes universal Gaussian-type flux distribution, non-unity sticking
coefficients, variable off-axis sensor location, and substrate tilt. The
resulting equation fits well the experimental data. The results can be
particularized for films deposited at normal incidence
