  In this work authors present for the first time how to apply the
additive-free, cured PDMS as a negative tone resist material, demonstrate the
creation of PDMS microstructures and test the solvent resistivity of the
created microstructures. The PDMS layers were 45 um and 100 um thick, the
irradiations were done with a focused proton microbeam with various fluences.
After irradiation, the samples were etched with sulfuric acid that removed the
unirradiated PDMS completely but left those structures intact that received
high enough fluences. The etching rate of the unirradiated PDMS was also
determined. Those structures that received at least 7.5*10^15 ion*cm-2 fluence
did not show any signs of degradation even after 19 hours of etching. As a
demonstration, 45 um and 100 um tall, high aspect ratio, good quality,
undistorted microstructures were created with smooth and vertical sidewalls.
The created microstructures were immersed into numerous solvents and some acids
to test their compatibility. It was found that the unirradiated PDMS cannot,
while the irradiated PDMS microstructures can resist to chloroform, n-hexane,
toluene and sulfuric acid. Hydrogen fluoride etches both the unirradiated and
the irradiated PDMS.
