  Rapid and reproducible assembly of aligned nanostructures on a wafer-scale is
a crucial, yet one of the most challenging tasks in the incorporation of
nanowires into integrated circuits. We present the synthesis of a periodic
nanochannel template designed for electrochemical growth of perfectly aligned,
rectangular nanowires over large areas. The nanowires can be electrically
contacted and characterized in situ using a pre-patterned multi-point
measurement platform. During the measurement the wires remain within a thick
oxide matrix providing protection against breaking and oxidation. We use laser
interference lithography, reactive ion etching and atomic layer deposition to
create cm-long parallel nanochannels with characteristic dimensions as small as
40 nm. In a showcase study pulsed electrodeposition of iron is carried out
creating rectangular shaped iron nanowires within the nanochannels. By design
of the device, the grown wires are in contact with an integrated electrode
system on both ends directly after the deposition. No further processing steps
are required for electrical characterization, minimizing the risk of damage and
oxidation. The developed nanowire measurement device allows for multi-probe
resistance measurements and can easily be adopted for transistor applications.
The guided, in-plane growth of electrodeposited nanowire arrays which are
tunable in size and density paves the way for the incorporation of nanowires
into a large variety of multifunctional devices.
