  This article is withdrawn since it is published in a journal
  We report on the first reduction methodology, compatible with flexible,
temperature sensitive substrates, for the production of reduced spin coated
graphene oxide (GO) electrodes. It is based on the use of a laser beam for the
in-situ, non-thermal, reduction of spin coated GO films on flexible substrates
over a large area. The photoreduction process is one-step, facile and is
rapidly carried out at room temperature in air without affecting the integrity
of the graphene lattice as well as the flexibility of the underlying substrate.
Conductive graphene films with a sheet resistance of as low as 700 {\Omega}/sq
can be obtained, much higher than flexible layers reduced by chemical means. As
a proof of concept of our technique, the laser-reduced GO (LrGO) films were
utilized as the transparent electrode in flexible, bulk heterojunction, organic
photovoltaic (OPV) devices, replacing the traditional ITO. The devices
displayed a power-conversion efficiency of 1.1 %, which is the highest reported
so far for OPV device incorporating reduced GO as the transparent electrode.
The in-situ non-thermal photoreduction of spin-coated GO films creates a new
way to produce flexible functional graphene electrodes for a variety of
electronic applications in a process that carries substantial promise for
potential industrial implementation.
