  The drying of a drop containing particles often results in the accumulation
of the particles at the contact line. In this work, we investigate the drying
of an aqueous colloidal drop surrounded by a hydrogel that is also evaporating.
We combine theoretical and experimental studies to understand how the
surrounding vapor concentration affects the particle deposit during the
constant radius evaporation mode. In addition to the common case of evaporation
on an otherwise dry surface, we show that in a configuration where liquid is
evaporating from a flat surface around the drop, the singularity of the
evaporative flux at the contact line is suppressed and the drop evaporation is
homogeneous. For both conditions, we derive the velocity field and we establish
the temporal evolution of the number of particles accumulated at the contact
line. We predict the growth dynamics of the stain and the drying timescales.
Thus, dry and wet conditions are compared with experimental results and we
highlight that only the dynamics is modified by the evaporation conditions, not
the final accumulation at the contact line.
