  We study how single-crystal chromium films of uniform thickness on W(110)
substrates are converted to arrays of three-dimensional (3D) Cr islands during
annealing. We use low-energy electron microscopy (LEEM) to directly observe a
kinetic pathway that produces trenches that expose the wetting layer. Adjacent
film steps move simultaneously uphill and downhill relative to the staircase of
atomic steps on the substrate. This step motion thickens the film regions where
steps advance. Where film steps retract, the film thins, eventually exposing
the stable wetting layer. Since our analysis shows that thick Cr films have a
lattice constant close to bulk Cr, we propose that surface and interface stress
provide a possible driving force for the observed morphological instability.
Atomistic simulations and analytic elastic models show that surface and
interface stress can cause a dependence of film energy on thickness that leads
to an instability to simultaneous thinning and thickening. We observe that
de-wetting is also initiated at bunches of substrate steps in two other
systems, Ag/W(110) and Ag/Ru(0001). We additionally describe how Cr films are
converted into patterns of unidirectional stripes as the trenches that expose
the wetting layer lengthen along the W[001] direction. Finally, we observe how
3D Cr islands form directly during film growth at elevated temperature. The Cr
mesas (wedges) form as Cr film steps advance down the staircase of substrate
steps, another example of the critical role that substrate steps play in 3D
island formation.
