  We systematically investigated various types of surfaces on which rubidium
(Rb) atoms were deposited by X-ray photoelectron spectroscopy (XPS) and
measured the light-induced atom desorption (LIAD) from those surfaces. The main
surfaces of interest included synthetic quartz, yttrium metal, and paraffin.
The Rb atoms deposited on quartz and yttrium surfaces by exposure to Rb vapor
at room temperature were detected by XPS. Quartz is originally silicon dioxide.
The yttrium surfaces were also oxidized, and Rb atoms reacted with oxygen on
both surfaces. Conversely, Rb deposition was observed only at low temperatures
on paraffin. Specifically, Rb atoms deposited on paraffin, which is not an
oxygen compound, also formed oxygen compounds under ultrahigh vacuum conditions
by reaction with the background gas. All examined surfaces showed a similar
light wavelength or photon energy dependence, such that the LIAD rates
increased with decreasing light wavelength. We presume that some types of
compounds of alkali metal and oxygen can be ubiquitous sources for LIAD from
many types of surfaces of alkali-metal vapor cells.
