  We report large-scale fabrication of perfectly functional radio frequency
(RF) surface ion traps on a 12-inch glass substrate with a standard
CMOS-compatible backend process. Established 12-inch foundry backend process of
electroplated Cu with Au finish are employed to fabricate the surface
electrodes directly on the glass wafer substrate. We tested a trap by loading
it with laser-cooled 88 Sr + ions. The trap shows a stable operation with RF
amplitude in the range 100-230 V at 33 MHz frequency. The ion lifetime is on
the order of 30 minutes for a pressure in the vacuum chamber of 5 x 10-11 mbar,
which demonstrates an exciting potential for future implementation of quantum
computing system with a standard foundry process on CMOS compatible and
cost-effective platform.
