  Here we propose a linear microbolometric array based on VOx thin films. The
linear microbolometric array is fabricated by using micromachining technology,
and its thermo-sensitive VOx thin film has excellent infrared response spectrum
and TCR characteristics. Nano-scale VOx thin films deposited on SiO2/Si
substrates were obtained by e-beam vapor deposition. The VOx films were then
annealed at temperatures between 300 to 500 C with various deposition duration
time. The crystal structures and microstructures were examined by XRD, SEM and
ESCA. These films showed a predominant phase of rhombohedral VO2 and the
crystallinity of the VO2 increased as the annealing temperature increased.
Integrated with CMOS circuit, an experimentally prototypical monolithic linear
microbolometric array is designed and fabricated. The testing results of the
experimental linear array show that the responsivity of linear array can
approach 18KV/W and is potential for infrared image systems.
