  Photolithography assisted chemo-mechanical etching (PLACE), a technique
specifically developed for fabricating highquality large-scale photonic
integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled
fabrication of a series of building blocks of PICs ranging from high-quality
(high-Q) microresonators and low-loss waveguides to electrooptically (EO)
tunable lasers and waveguide amplifiers. Aiming at high-throughput
manufacturing of the PIC devices and systems, we have developed an
ultra-high-speed high-resolution laser lithography fabrication system employing
a high repetition rate femtosecond laser and a high-speed polygon laser
scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been
achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale
fabrication of TFLN-based photonic structures, optical phase masks as well as
color printing
