  In this work we consider the inverse problem of finding guiding pattern
shapes that result in desired self-assembly morphologies of block copolymer
melts. Specifically, we model polymer self-assembly using Self-Consistent Field
Theory and derive in a non-parametric setting the sensitivity of the misfit
between desired and actual morphologies to arbitrary perturbations in the
guiding pattern shape. The obtained sensitivities are used for optimization of
the confining pattern shapes such that the misfit between desired and actual
morphologies is minimized. The efficiency and robustness of the proposed
algorithm is demonstrated on a number of examples related to templating
Vertical Interconnect Accesses.
