  We explore possibilities of waveguide-mode interference lithography (WMIL)
technique for high contrast subwavelength structures in the visible region.
Selecting an appropriate waveguide-mode, we demonstrate high contrast resist
mask patterns for the first time. TM1 mode in the waveguide is shown to be
useful for providing a three-dimensional structure whose cross section is
checkerboard pattern. Applying our WMIL technique, we demonstrate 1D, 2D and 3D
subwavelength resist patterns that are widely used for the fabrication of
metamteterials in the visible region. In addition to the resist patterns, we
demonstrate a resonance at 1.9 eV for a split tube structure experimentally.
