  A blueprint for producing scalable digital graphene electronics has remained
elusive. Current methods to produce semiconducting-metallic graphene networks
all suffer from either stringent lithographic demands that prevent
reproducibility, process-induced disorder in the graphene, or scalability
issues. Using angle resolved photoemission, we have discovered a unique one
dimensional metallic-semiconducting-metallic junction made entirely from
graphene, and produced without chemical functionalization or finite size
patterning. The junction is produced by taking advantage of the inherent,
atomically ordered, substrate-graphene interaction when it is grown on SiC, in
this case when graphene is forced to grow over patterned SiC steps. This
scalable bottomup approach allows us to produce a semiconducting graphene strip
whose width is precisely defined within a few graphene lattice constants, a
level of precision entirely outside modern lithographic limits. The
architecture demonstrated in this work is so robust that variations in the
average electronic band structure of thousands of these patterned ribbons have
little variation over length scales tens of microns long. The semiconducting
graphene has a topologically defined few nanometer wide region with an energy
gap greater than 0.5 eV in an otherwise continuous metallic graphene sheet.
This work demonstrates how the graphene-substrate interaction can be used as a
powerful tool to scalably modify graphene's electronic structure and opens a
new direction in graphene electronics research.
