  In this letter, we present a study of the condensation of exciton-polaritons
in large etched pillar structures that exhibit shallow edge trapping. The
$\approx$ 100 $\mu$m $\times$ 100 $\mu$m pillars were fabricated using
photolithography and a BCl$_3$/Cl$_2$ reactive ion etch. A low energy region
emerged along the etched edge, with the minima $\approx$ 7 $\mu$m from the
outer edge. The depth of the trap was 0.5-1.5 meV relative to the level central
region, with the deepest trapping at the corners. We were able to produce a
Bose-Einstein condensate in the trap near the edges and corners by pumping
non-resonantly in the middle of the pillar. This condensate began as a set of
disconnected condensates at various points along the edges, but then became a
single mono-energetic condensate as the polariton density was increased.
Similar edge traps could be used to produce shallow 1D traps along edges or
other more complex traps using various etch geometries and scales.
