  Miniature concave hollows, made by wet etching silicon through a circular
mask, can be used as mirror substrates for building optical micro-cavities on a
chip. In this paper we investigate how ICP polishing improves both shape and
roughness of the mirror substrates. We characterise the evolution of the
surfaces during the ICP polishing using white-light optical profilometry and
atomic force microscopy. A surface roughness of 1 nm is reached, which reduces
to 0.5 nm after coating with a high reflectivity dielectric. With such smooth
mirrors, the optical cavity finesse is now limited by the shape of the
underlying mirror.
