  We propose a light-sheet based plane-selective fabrication technique that
enables fabrication of nano-electronic/nano-fluidic components (nano-wires,
nano-waveguides, nano-gratings and nano-channels) with specificity, selectivity
on a user-defined patterning area. The technique is termed as, interfering
coherent lightsheet assisted structure synthesis (iCLASS). iCLASS use
specialized $2\pi$-geometry (consists of two opposing cylindrical lenses) that
facilitates interference of counter-propagating light-sheets at a common
geometrical focus. This gives rise to 1D interference pattern with a feature
size of less than diffraction limit. A commercially available S1813 photoresist
coated on a cleaned glass substrate is subsequently exposed to the light-sheets
pattern (visible light). This is followed by the development of photoresist
film to imprint the 1D nano-pattern. Experimental study and analysis shows an
inter-feature spacing and feature-size of approximately, $\lambda/2$.
Investigation show that the light-dose interaction-time ($\tau_{exp}
+\tau_{dev}$) play crucial role in determining the feature-size and quality of
fabricated nano-pattern array. The proposed iCLASS technique may find
applications in nanoscience and nanotechnology.
