  Under specific experimental circumstances, sputter erosion on semiconductor
materials exhibits highly ordered hexagonal dot-like nanostructures. In a
recent attempt to theoretically understand this pattern forming process, Facsko
et al. [Phys. Rev. B 69, 153412 (2004)] suggested a nonlocal, damped
Kuramoto-Sivashinsky equation as a potential candidate for an adequate
continuum model of this self-organizing process. In this study we theoretically
investigate this proposal by (i) formally deriving such a nonlocal equation as
minimal model from balance considerations, (ii) showing that it can be exactly
mapped to a local, damped Kuramoto-Sivashinsky equation, and (iii) inspecting
the consequences of the resulting non-stationary erosion dynamics.
