  We present NanoImprint lithography experiments and modeling of thin films of
block copolymers (BCP). The NanoImprint lithography is used to align
perpendicularly lamellar phases, over distances much larger than the natural
lamellar periodicity. The modeling relies on self-consistent field calculations
done in two- and three-dimensions. We get a good agreement with the NanoImprint
lithography setups. We find that, at thermodynamical equilibrium, the ordered
BCP lamellae are much better aligned than when the films are deposited on
uniform planar surfaces.
