  We have performed Kinetic Monte Carlo simulation work to study the effect of
diffusion anisotropy, bonding anisotropy and edge diffusion on island formation
at different temperatures during the sub-monolayer film growth in Molecular
Beam Epitaxy. We use simple cubic solid on solid model and event based Bortz,
Kalos and Labowitch (BKL) algorithm on the Kinetic Monte Carlo method to
simulate the physical phenomena. We have found that the island morphology and
growth exponent are found to be influenced by substrate anisotropy as well as
edge diffusion, however they do not play a significant role in island
elongation. The growth exponent and island size distribution are observed to be
influenced by substrate anisotropy but are negligibly influenced by edge
diffusion. We have found fractal islands when edge diffusion is excluded and
compact islands when edge diffusion is included.
