  We have studied the influence of disorder on the Kondo effect in thin films
of Cu(Mn), i.e., Cu doped with a small amount of Mn. We find that the Kondo
contribution to the resistivity is suppressed when the elastic mean-free-path,
$\lambda$, is reduced. While this is qualitatively similar to results found
previously by our group in a different material, our new experiments reveal in
detail how this suppression depends on both film thickness and $\lambda$. These
results are compared with the theory of Martin, Wan, and Phillips. While there
is general qualitative agreement with this theory, there appear to be some
quantitative discrepancies.
