  The ability to control porosity in oxide thin films is one of the key factors
that determine their properties. Despite the abundance of dry processes for the
synthesis of oxide porous layers, the high porosity range is typically achieved
by spin-coating-based wet chemical methods. Besides, special techniques such as
supercritical drying are required to replace the pore liquid with air while
maintaining the porous network. In this study, we propose a new method for the
fabrication of ultra-porous titanium dioxide thin films at room or mild
temperatures (T lower or equal to 120 degrees Celsius) by the sequential
process involving plasma deposition and etching. These films are conformal to
the substrate topography even for high-aspect-ratio substrates and show
percolated porosity values above 85 percent that are comparable to advanced
aerogels. The films deposited at room temperature are amorphous. However, they
become partly crystalline at slightly higher temperatures presenting a
distribution of anatase clusters embedded in the sponge-like structure.
Surprisingly, the porous structure remains after annealing the films at 450
degrees Celsius in air, which increases the fraction of the embedded anatase
nanocrystals. The films are antireflective, omniphobic, and photoactive
becoming super-hydrophilic subjected to UV light irradiation The supported
percolated nanoporous structure can be used as an electron-conducting electrode
in perovskite solar cells. The properties of the cells depend on the aerogel
film thickness reaching efficiencies close to those of commercial mesoporous
anatase electrodes. This generic solvent-free synthesis is scalable and is
applicable to ultra-high porous conformal oxides of different compositions with
potential applications in photonics, optoelectronics, energy storage, and
controlled wetting.
