  Understanding the effect of fabrication conditions on domain wall motion in
thin films with perpendicular magnetization is a mandatory issue in order to
tune their properties aiming to design spintronics devices based on such
phenomenon. In this context, the present work intends to show how different
growth conditions may affect domain wall motion in the prototypical system
Pt/Co/Pt. The trilayers were deposited by dc sputtering, and the parameters
varied in this study were the Co thickness, the substrate roughness, and the
base pressure in the deposition chamber. Magneto-optical Kerr effect-based
magnetometry and microscopy combined with X-ray reflectometry, atomic force
microscopy, and transmission electron microscopy were adopted as experimental
techniques. This permitted us to elucidate the impact on the hysteresis loops
and on the domain wall dynamics, produced by different growth conditions. As
other authors, we found that Co thickness is strongly determinant for both the
coercive field and the domain wall velocity. On the contrary, the topographic
roughness of the substrate and the base pressure of the deposition chamber
evidence a selective impact on the nucleation of magnetic domains and on domain
wall propagation, respectively, providing a tool to tune these properties.
