  Many modern applications, including quantum computing and quantum sensing,
use substrate-film interfaces. Particularly, thin films of chromium or titanium
and their oxides are commonly used to bind various structures, such as
resonators, masks, or microwave antennas, to a diamond surface. Due to
different thermal expansions of involved materials, such films and structures
could produce significant stresses, which need to be measured or predicted. In
this paper, we demonstrate imaging of stresses in the top layer of diamond with
deposited structures of Cr$_2$O$_3$ at temperatures 19$^{\circ}$C and
37$^{\circ}$C by using stress-sensitive optically detected magnetic resonances
(ODMR) in NV centers. We also calculated stresses in the diamond-film interface
by using finite-element analysis and correlated them to measured ODMR frequency
shifts. As predicted by the simulation, the measured high-contrast
frequency-shift patterns are only due to thermal stresses, whose spin-stress
coupling constant along the NV axis is 21$\pm$1 MHz/GPa, that is in agreement
with constants previously obtained from single NV centers in diamond
cantilever. We demonstrate that NV microscopy is a convenient platform for
optically detecting and quantifying spatial distributions of stresses in
diamond-based photonic devices with micrometer precision and propose thin films
as a means for local application of temperature-controlled stresses. Our
results also show that thin film structures produce significant stresses in
diamond substrates, which should be accounted for in NV-based applications.
