  Ni$_3$In$_2$S$_2$ is the most recent entrant into the family of topological
insulator (TI) materials, the same exhibits very high MR in a low-temperature
regime. Here, we report the crystal growth, the structural, micro-structural,
and magneto-transport study of Ni$_3$In$_2$S$_2$ down to 2.5K under an applied
field of up to 14Tesla. The phase purity and growth direction of a single
crystal is studied by performing XRD on both powder and flake and further
Rietveld analysis is also carried out. The electrical transport measurements
are studied and the grown crystal showed metallic behaviour down to 2.5K, with
an R300K/R2K ratio of around 7. A significant variation in magnetoresistance
(MR) values is observed as the temperature is increased from 2.5K to 200K under
an applied field of up to 14 Tesla. Interestingly the low T (2.5K), MR shows a
clear V-type characteristic TI cusp. Magnetoconductivity data at low fields
(1Tesla) is fitted with the Hikami Larkin Nagaoka (HLN) model, which showed the
presence of a weak anti-localization effect in the synthesized
Ni$_3$In$_2$S$_2$ crystal at low temperatures. We have successfully grown near
single-phase Ni$_3$In$_2$S$_2$ and its TI behavior is demonstrated by
magneto-transport measurements.
