  Graphene is well known to grow as flat sheets aligned with the growth
substrate. Oriented graphene structures typically normal to the substrate have
recently gained major attention. Most often, normal orientation is achieved in
plasma-assisted growth and is believed to be due to plasma induced in-built
electric field, which is usually oriented normal to the substrate. This work
focuses on the effect of in-built electric field on growth direction,
morphology, interconnectedness, and physical properties of various
configurations of graphene structures and reveals the unique dependence of
these features on electric field orientation. It is shown that tilting of
growth substrates from parallel to normal direction with respect to the
direction of inbuilt plasma electric field leads to the morphological
transitions from flat graphene structure, to oriented individual graphene
sheets and then interconnected three-dimensional networks of oriented graphene
sheets. The revealed transition of the growth orientation leads to change in
wetting nature, types of defect in graphitic structures as well as affects
their charge storage capacity when used as supercapacitor electrodes. This
simple and versatile approach opens new opportunities for the production of
potentially large batches of differently oriented and structured graphene
sheets in one production run.
