  Lithography-free metasurfaces composed of a nano-layered stack of materials
are attractive not only due to their optical properties but also by virtue of
fabrication simplicity and cost reduction of devices based on such structures.
We demonstrate a multi-layer metasurface with engineered electromagnetic
absorption in the mid-infrared (MIR) wavelength range. Characterisation of thin
SiO$_2$ and Si films sandwiched between two Au layers by way of experimental
absorption and thermal radiation measurements as well as finite difference time
domain (FDTD) numerical simulations is presented. Comparison of experimental
and simulation data of optical properties of multilayer metasurfaces show
guidelines for the absorber/emitter applications.
