  Self-aligned double patterning (SADP) has become a promising technique to
push pattern resolution limit to sub-22nm technology node. Although SADP
provides good overlay controllability, it encounters many challenges in
physical design stages to obtain conflict-free layout decomposition. In this
paper, we study the impact on placement by different standard cell layout
decomposition strategies. We propose a SADP friendly standard cell
configuration which provides pre-coloring results for standard cells. These
configurations are brought into the placement stage to help ensure layout
decomposability and save the extra effort for solving conflicts in later
stages.
