  Metallic gratings were fabricated using high energy laser interference
lithography with a frequency tripled Nd:YAG nanosecond laser. The grating
structures were first recorded in a photosensitive layer and afterwards
transferred to an Au film. High quality Au gratings with a period of 770 nm and
peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were
successfully designed, fabricated and characterized.
