  We present and experimentally validate a model describing the sensitivity of
the tilt angle, expansion and propulsion velocity of a tin micro-droplet
irradiated by a 1 {\mu}m Nd:YAG laser pulse to its relative alignment. This
sensitivity is particularly relevant in industrial plasma sources of extreme
ultraviolet light for nanolithographic applications. Our model has but a single
parameter: the dimensionless ratio of the laser spot size to the effective size
of the droplet, which is related to the position of the plasma critical density
surface. Our model enables the development of straightforward scaling arguments
in turn enabling precise control the alignment sensitivity.
