Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm
Amplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number ≤ 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirror giving double-pass amplification. Saturation of the ASE output was observed. The beam divergence was about 8× diffraction limited with a brightness estimated at 1014 W cm-2sr-1. The feedback from...
Carillon, A., Chen, H. Z., Dhez, P., Dwivedi, L., Jacoby, J., Jaegle, P., Jamelot, G., Zhang, J., Key, M. H., Kidd, A., Klisnick, A., Kodama, R., Krishnan, J., Lewis, C. L. S., Neely, D., Norreys, P., O'Neill, D., Pert, G. J., Ramsden, S. A., … Uhomoibhi, J. (1992). Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm. Physical Review Letters, 68(19), 2917–2920.
Carillon, A., et al. "Saturated and near-Diffraction-Limited Operation of an XUV Laser at 23.6 Nm." Physical Review Letters, vol. 68, no. 19, 1992, pp. 2917–20.
Carillon, A, HZ Chen, P Dhez, L Dwivedi, J Jacoby, P Jaegle, G Jamelot, et al. 1992. "Saturated and near-Diffraction-Limited Operation of an XUV Laser at 23.6 Nm." Physical Review Letters 68 (19): 2917–20.
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