Noel Technologies' in-house Lithography services include engineering support for mask layout, process development, insuring success of each design. Our experienced technical group can cost effectively solve many problems.
Tool sets include two steppers, contact printing, SEM Analysis, Profiler, Alpha Step, Thin Film Mapping, as well as multiple wet etch chemistry's and a Plasma Etch System.
ASML Advanced Stepper Lithography ASML5500-300: DUV (248nm) 0.15um Resolution.
ASML Advanced Stepper Lithography ASML5500-200: I Line (365nm) 0.35um Resolution.
Noel offers a number of resist types and thicknesses as blanket coatings for equipment tests. Wafer diameter ranges from 300mm to 100mm as well as non-standard substrate sizes. All resist types are qualified and measured for film thickness and uniformity via a film mapping system.